Electro-micro-mechanical shutters on transparent substrates

• US 5,784,190 A
• Filed: 04/27/1995
• Issued: 07/21/1998
• Est. Priority Date: 04/27/1995
• Status: Expired due to Fees

• Current Assignee: John M. Baker
• Original Assignee: John M. Baker
• Inventors: Worley, Eugene R.
• Primary Examiner(s): Nelms, David C.
• Assistant Examiner(s): BEY, DAWN MARIE
• Application Number:
  US08/429,674
• Time in Patent Office: 1,181 Days
• Field of Search: 359/290, 359/291, 359/295, 359/846, 359/850, 359/855
• US Class Current: 359/291
• CPC Class Codes: G02B 26/02 for controlling the intensity of light G02B26/004 takes precedence

Abstract

Micro-mechanical flappers for use as an electronic display technology and methods related to the fabrication thereof are disclosed. These methods are consistent with standard silicon based semiconductor processing used to make integrated circuits. One embodiment shows how cross-talk or flapper-to-flapper interference is minimized using a Digital Signal Processor (DSP) to compensate for this undesirable effect. Also disclosed is the construction of a micro-mechanical flapper that uses a combination of two springs, viz. a leaf spring and a torsion spring, to reduce maximum bending stress and to lower operating voltage. Also, the spring construction is made such that axial stability is improved over a single leaf spring approach and a light shield is integrated onto the flapper assembly so that the overhead stationary electrode is simply a supporting glass plate with a transparent conducting layer over its surface. Another construction is also disclosed in which the flapper and light shield are integrated onto the overhead electrode assembly while the attracting stationary counter electrode, select transistor, and retention capacitor are located on another integrated assembly. Finally, an L-shaped attracting electrode is used to lower voltages required to bend the flapper spring.

Claims

1. In a micro-mechanical shutter of the type wherein an electrically conductive micro-mechanical shutter plate is maintained over a transparent substrate by a conductive spring means and is deflected by an attracting counter electrode to modulate the angle of deflection of the shutter plate to modulate the amount of light passing through the shutter, the improvement wherein said spring means includes a combined torsion spring and a leaf spring means.

2. The shutter recited in claim 1 wherein,

said leaf spring means includes two leaf springs, each having a first end and a second end,

the first end of each leaf spring is coupled to a first end of the shutter plate;

and

said leaf springs are coupled at said second ends to said torsion spring.

3. The shutter recited in claim 1 wherein,

said spring means is serpentine in configuration.

4. The shutter recited in claim 1 wherein,

said spring means includes a plurality of interconnected stacked spring elements.

5. The shutter recited in claim 1 wherein,

said torsion spring is attached to said shutter assembly at the center of the torsion spring.

6. The shutter recited in claim 1 including,

an anti-reflective coating disposed on the surface of said shutter plate that is exposed to light.

7. The micro-mechanical shutter recited in claim 1 comprising,

an array of electrically conductive micro-mechanical shutter plate electrodes, each of which defines a pixel, and

means for correcting for pixel to pixel interference between adjacent pixels to compensate for the effect of electric fields of adjacent pixels on each other.

8. The array recited in claim 7 wherein,

said means for correcting for pixel to pixel interference includes means for modulating the voltage applied to the electrodes of adjacent pixels to compensate for the effect of reflected light of adjacent pixels on each other.

9. The array recited in claim 7 wherein,

said means for correcting for pixel to pixel interference includes an antireflective coating disposed on the surface of shutter plate electrode that is exposed to light.

10. The array recited in claim 8 wherein,

said means for correcting for pixel to pixel interference includes an antireflective coating disposed on the surface of shutter plate electrode that is exposed to light.

11. The micro-mechanical shutter recited in claim 6 including;

a select transistor disposed on said transparent substrate;

a first light shield layer disposed for blocking light at the edges of the shutter plate; and

a second light shield layer for blocking light from striking said select transistor.

12. The shutter recited in claim 1 wherein,

said conductive spring means is a metal.

13. The shutter recited in claim 1 wherein,

said conductive spring means is aluminum.

14. The shutter recited in claim 1 wherein,

said conductive spring means is a flexible insulator coated with a conductive film.

15. The shutter recited in claim 14 wherein,

said conductive spring means is polymide coated with chromiun.

16. The shutter recited in claim 11 wherein,

said attracting counter electrode includes:

a transparent insulating substrate; and

a transparent conductive layer disposed on said substrate.

17. The shutter recited in claim 16 wherein,

said transparent conductive layer is indium tin oxide.

18. The shutter recited in claim 16 wherein,

said attracting counter electrode includes a transparent insulating layer disposed on said transparent conductive layer.

19. The shutter of claim 18 wherein,

said transparent insulating layer is silicon dioxide.

20. The micro-mechanical shutter recited in claim 1 wherein,

said transparent substrate is adapted for receiving light on a first side of said substrate;

said shutter disposed on the side of said substrate opposite the side for receiving light; and

light shield means for blocking light which is not modulated by said shutter.

21. The shutter recited in claim 20 including:

a second transparent substrate;

a select transistor disposed on said second transparent substrate; and

a first transparent electrode disposed on said second transparent substrate.

22. The shutter recited in claim 21 including,

a retention capacitor disposed on said second transparent substrate;

an X select line,

a Y signal data line, and

a light shield for the select transistor, said light shield forming one plate of said retention capacitor.

23. The shutter recited in claim 22 including,

a second transparent electrode coupled to said first transparent electrode,

said second transparent electrode disposed on said second transparent substrate and oriented normal to said first transparent electrode.

24. The shutter recited in claim 23 wherein,

said first and second transparent electrodes form an L-shaped electrode.