Optical proximity correction method for intermediate-pitch features using sub-resolution scattering bars on a mask

  • US 5,821,014 A
  • Filed: 02/28/1997
  • Issued: 10/13/1998
  • Est. Priority Date: 02/28/1997
  • Status: Expired due to Term
First Claim
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1. A method of providing non-resolvable correction features on a mask for correcting for proximity effects, said mask including at least two feature edges, said correction features having an associated nominal width, associated nominal spacing from a given mask feature edge, and an associated nominal spacing between adjacent correction feature edges, said method comprising the steps of:

  • adding a single non-resolvable correction feature between two adjacent mask edges on a mask, said correction feature having an edge adjacent to each of said two adjacent mask edges, wherein said adjacent correction feature edges are spaced a distance from said two adjacent edges that is less than said nominal spacing but greater than a given minimum distance;

    adding two non-resolvable correction features between two adjacent edges on a mask wherein said correction feature is spaced a distance from each of said two adjacent edges that is less than said nominal spacing but greater than a given minimum distance.

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