Rectangular vacuum-arc plasma source

• US 5,840,163 A
• Filed: 12/22/1995
• Issued: 11/24/1998
• Est. Priority Date: 04/25/1994
• Status: Expired due to Term

• Current Assignee: Vapor Technologies, Inc. (Masco Corporation)
• Original Assignee: Vapor Technologies, Inc. (Masco Corporation)
• Inventors: Welty, Richard P.
• Primary Examiner(s): Breneman, R. Bruce
• Assistant Examiner(s): MCDONALD, RODNEY GLENN
• Application Number:
  US08/577,810
• Time in Patent Office: 1,068 Days
• Field of Search: 204/192.13, 204/192.38, 204/298.03, 204/298.05, 204/298.41, 118/723 R, 118/723 HC, 118/723 VE, 427/580, 250/426, 315/111.81
• US Class Current: 204/192.38
• CPC Class Codes: C23C 14/221 Ion beam deposition C23C14/46, C23C14/48 take precedence
• CPC Class Codes: C23C 14/325 Electric arc evaporation
• CPC Class Codes: H01J 2237/022 Avoiding or removing foreign or contaminating particles, debris or deposits on sample or tube
• CPC Class Codes: H01J 37/32055 Arc discharge
• CPC Class Codes: H01J 37/3266 Magnetic control means

Abstract

A rectangular vacuum-arc plasma source and associated apparatus for generating and directing a stream of plasma containing an ionized vapor of a cathode material toward a substrate by vacuum arc evaporation of a rectangular planar cathode mounted in a rectangular plasma duct. The rectangular duct conducts the plasma from the cathode to the substrate region, while intercepting the molten droplets of cathode material also generated by the arc. Magnets control the arc motion on the cathode surface while simultaneously generating the magnetic field which guides the plasma through the duct. Benefits of a filtered cathodic arc (fully ionized vapor stream, elimination of splattered droplets) are combined with the benefits of a rectangular source (uniform evaporation from the source and uniform deposition on the substrate using linear motion). The rectangular source may be extended indefinitely in length, thus allowing coating or ion implantation on large or long substrates.

Claims

1. An apparatus for a vacuum arc discharge, said apparatus comprising:

(a) a cathode composed at least in part of a material to be evaporated, said cathode having an evaporable surface of substantially rectangular shape,

(b) sensing means operatively connected at or near each of a pair of opposite ends along a length of said evaporable surface for sensing when an arc spot approaches either of said opposite ends, said sensing means capable of generating a signal when the arc spot approaches either of said opposite ends,

(c) magnetic field establishing means for establishing over said evaporable surface a magnetic field, said magnetic field being represented by magnetic flux lines, said magnetic field establishing means being independent of an electrical current flowing through said cathode, and said flux lines having a predominant component which is substantially parallel to said evaporable surface and substantially perpendicular to the length thereof, and

(d) magnetic field reversing means for reversing the direction of said magnetic flux lines responsive to said signal from said sensing means without substantially changing the shape of said predominant component thereof or its orientation with respect to said evaporable surface.

2. The apparatus of claim 1 wherein the length of said evaporable surface of substantially rectangular shape is substantially parallel to a first edge of said surface and said evaporable surface has a width substantially parallel to a second edge of said surface at about a right angle to said first edge, wherein the length is at least twice as long as the width.

3. The apparatus of claim 2 wherein the length is at least five times as long as the width.

4. The apparatus of claim 3 wherein the length is at least ten times as long as the width.

5. A plasma duct for a vacuum arc discharge, said plasma duct comprising:

(a) an entrance arm of rectangular cross section having a width and a length in substantially the same proportions as, and at least as large as, those of a substantially rectangular cathode adopted to be mounted at or near said entrance arm,

(b) an exit arm of rectangular cross section, the plasma duct having an axis alone a center line passing from the entrance arm through the exit arm,

(c) a bend between said entrance arm and said exit arm, said bend having an inner radius and an outer radius, and

(d) magnetic field generating means disposed in relation to said plasma duct for generating within said duct a magnetic field having a magnetic flux density in the vicinity of said outer radius which is greater than or equal to the magnetic flux density in the vicinity of said inner radius, said magnetic field being represented by magnetic flux lines, a portion of said magnetic flux lines being oriented in a direction substantially parallel to the axis of said plasma duct within said exit arm.

6. The plasma duct of claim 5 wherein said magnetic field generating means further comprises means for generating within said duct a magnetic field, said magnetic field being represented by magnetic flux lines, and said magnetic field including a region in which said flux lines converge forming a magnetic mirror, said magnetic mirror being oriented in a direction perpendicular to a wall of the duct in the region of said duct in which said magnetic mirror is generated.

7. The apparatus of claim 5 wherein said bend is within a range of 10-120 degrees.

8. The apparatus of claim 7 wherein said bend is within a range of 10-90 degrees.

9. The plasma duct of claim 5 further comprising a set of baffles disposed on the inside of the duct.

10. The plasma duct of claim 5 wherein said rectangular cross section of said entrance arm has a length and a width wherein the length is at least twice as long as the width.

11. The plasma duct of claim 10, wherein the length is at least five times as long as the width.

12. The plasma duct of claim 11, wherein the length is at least ten times as long as the width.

13. A method of controlling an arc discharge between a cathode composed at least in part of a material to be evaporated, and an anode, said arc discharge originating in an arc spot on an evaporable surface of the cathode having a length and a width, said method comprising:

(a) establishing over said evaporable surface a magnetic field, said magnetic field being represented by magnetic flux lines, said magnetic field establishing means being independent of a electrical current flowing through said cathode, and said flux lines having a predominant component which is substantially parallel to said evaporable surface and substantially perpendicular to the length thereof;

(b) detecting whenever said arc spot approaches either end of the length of said evaporable surface of the cathode; and

(c) whenever said arc spot detected by said detecting step approaches either end of said evaporable surface of the cathode, reversing the direction of said magnetic flux lines without substantially changing the shape of said predominant component thereof or its orientation with respect to said evaporable surface.

14. An apparatus for generating a beam of plasma containing an ionized vapor of a cathode material, in which a vacuum arc discharge is used to vaporize said cathode material, comprising:

(a) a cathode having an evaporable surface of substantially rectangular shape;

(b) an anode;

(c) an arc power supply operatively connected to the cathode and the anode;

(d) a plasma duct for transporting to a substrate area in which an object to be coated or implanted may be located, at least part of the plasma containing an ionized vapor of the cathode, said plasma generated by an arc discharge from said cathode, and said plasma duct having a rectangular cross-sectional shape and a width and a length in substantially the same proportions as, and at least as large as, those of said cathode, said plasma duct containing a bend in the axis along its centerline, forming in said plasma duct an entrance arm and an exit arm, said cathode being located at or near the end of said entrance arm with said evaporable surface facing into said plasma duct, and said substrate area being located at or near the end of said exit arm,

(e) magnetic field generating means in electromagnetic communication with said plasma duct for generating within the plasma duct and over said evaporable surface of said cathode a magnetic field, said magnetic field being represented by magnetic flux lines, at least a first portion of said magnetic flux lines being oriented in a direction substantially parallel to the axis of said duct within said exit arm, and at least a second portion of said flux lines having a predominant component oriented substantially parallel to said evaporable surface of said cathode within the region of said entrance arm at or near said cathode;

(f) sensor means for sensing an arc spot, said sensor means located adjacent to each end of said rectangular evaporable surface of said cathode, said sensor means being capable of producing a signal whenever said arc spot approaches either end of said evaporable surface; and

(g) magnetic field reversing means responsive to said signal from the sensor means for reversing the direction of at least said second portion of said magnetic flux lines without substantially changing the shape of said second portion of said flux lines or their orientation with respect to said plasma duct.

15. The apparatus of claim 14 wherein said bend has an inner radius and an outer radius, and wherein said magnetic field generating means further comprises means for generating within said duct a magnetic field having magnetic flux density (field strength) in the vicinity of the outer radius which is greater than or equal to the flux density in the vicinity of the inner radius.

16. The apparatus of claim 15 wherein said bend is within a range of 10-120 degrees.

17. The apparatus of claim 16 wherein said bend is within a range of 45-90 degrees.

18. The apparatus of claim 14 further comprising magnetic field reversing means for reversing the direction of the first portion of said magnetic flux lines without substantially changing the shape of said flux lines or their orientation with respect to said plasma duct.

19. The apparatus of claim 14, wherein:

(a) said magnetic field generating means comprises at least one electromagnetic coil, and

(b) said magnetic field reversing means comprises at least one electromagnet power supply capable of passing current through said electromagnetic coil in either direction, and said electromagnet power supply being capable of reversing the direction of current flow through said electromagnetic coil based on the signal from said sensor means.

20. The apparatus of claim 19, wherein:

(a) said magnetic field generating means further comprises at least two electromagnet coils,

(b) said magnetic field reversing means further comprises at least two electromagnet power supplies capable of passing current in either direction, said at least two electromagnet power supplies being capable of reversing the direction of current flow through said electromagnet coils simultaneously based on the signal from said sensor means,

(c) said at least two electromagnet power supplies having current varying means for independently varying the current in said electromagnet coils in order to adjust the magnetic field strength independently in different parts of said plasma duct.

21. The apparatus of claim 14 wherein said magnetic field generated by said magnetic field generating means includes a region within said entrance arm of said plasma duct in which said magnetic flux lines converge, forming a magnetic mirror adjacent and parallel to said rectangular cathode, said magnetic mirror being oriented in a direction which reflects plasma towards said exit arm of said plasma duct.

22. The apparatus of claim 14 wherein said anode means include said plasma duct.

23. The apparatus of claim 14 wherein said anode means are electrically connected to said plasma duct.

24. The apparatus of claim 14 further comprising at least one electrically isolated electrode mounted inside said plasma duct, said electrode being electrically floating with respect to said anode.

25. The apparatus of claim 14 further comprising at least one electrically isolated electrode mounted inside said plasma duct, said electrode being biased positively with respect to said anode.

26. The apparatus of claim 14 wherein said anode includes an electrically isolated electrode.

27. The apparatus of claim 14 wherein at least a part of an inside wall of said plasma duct is lined with baffles.

28. The apparatus of claim 27 wherein said baffles include a plurality of walls mounted substantially parallel to one another and substantially perpendicular to said inside wall of said plasma duct and extending part way into said duct.

29. The apparatus of claim 14 wherein said plasma duct is electrically floating with respect to said anode.

30. The apparatus of claim 14 wherein said plasma duct is electrically biased positively with respect to said anode.