Planar microlens array and method of making same

• US 5,867,321 A
• Filed: 12/13/1996
• Issued: 02/02/1999
• Est. Priority Date: 12/29/1994
• Status: Expired due to Term

• Current Assignee: Sharp Kabushiki Kaisha (Hon Hai Precision Industry Co., Ltd.), Nippon Sheet Glass Company Limited
• Original Assignee: Nippon Sheet Glass Company Limited
• Inventors: Hamanaka, Kenjiro, Hamada, Hiroshi, Taniguchi, Satoshi, Nakama, Kenichi
• Primary Examiner(s): Epps, Georgia Y.
• Assistant Examiner(s): MACK, RICKY LEVERN
• Application Number:
  US08/700,397
• Time in Patent Office: 781 Days
• Field of Search: 359/619, 359/620, 359/628, 359/900, 349/95, 349/5
• US Class Current: 359/619
• CPC Class Codes: G02B 3/0012 characterised by the manufacturing method
• CPC Class Codes: G02B 3/0056 arranged along two different directions in a plane, e.g. honeycomb arrangement of lenses G02B3/0043 takes precedence; miniaturised objectives for electronic devices employing wafer level optics G02B13/0085
• CPC Class Codes: G02B 3/0087 with index gradient
• CPC Class Codes: Y10S 359/90 Methods

Abstract

A microlens array of high converging efficiency is provided, independently of the array and lens filling rate of microlens arrays, with a method of manufacturing microlens arrays using the diffusion process. A multitude of refractive-index distribution type microlenses formed by diffusing in a planar transparent substrate a substance contributing to increasing the refractive index of the substrate are two-dimensionally and regularly arranged on the surface of the substrate. The microlenses are densely arranged on the surface of the substrate, and diffusion fronts of the microlenses form regions where the diffusion fronts are fused with those of the adjoining microlenses. The length of a region where certain two adjoining microlenses are fused together, in the direction of a straight line connecting the centers of the two microlenses is less than 20% of the array pitch of the microlenses in the above-mentioned direction.

Claims

1. A method of manufacturing a planar microlens array having a multitude of refractive-index distribution type microlenses of a polygonal circumferential shape arranged two-dimensionally and periodically on the surface of a planar transparent substrate, characterized in that said method includes the steps of:

preparing a planar transparent substrate,

forming on the surface of said substrate a diffusion-inhibiting mask film having a multitude of periodically arranged mask apertures of a shape enclosed by straight lines that are parallel with and disposed at a predetermined interval inwardly away from sides of said polygonal circumferential shape, and

forming microlenses over the almost entire surface of said substrate by diffusing in said substrate a substance contributing to increasing the refractive index of said substrate through said mask apertures.

3. A method of manufacturing a planar microlens array as set forth in claim 1 or 2, wherein said substance contributing to increasing the refractive index of said substrate is diffused with the ion diffusion process or the diffusion copolymerization process, diffusion time or copolymerization time is controlled so that said microlenses are densely arranged on the surface of said substrate, diffusion fronts of said microlenses form regions where said diffusion fronts are fused with diffusion regions of adjoining microlenses, and then length, in the direction of a straight line connecting centers of adjoining two microlenses, of said regions where said two microlenses are fused together becoming less than 20% of an array pitch of said microlenses in said direction.

4. A method of manufacturing a planar microlens array as set forth in claim 3, wherein the shape of said mask apertures is a square, hexagon, or star shape.

5. A method of manufacturing a planar microlens array as set forth in claim 1 or 2, wherein when said substance contributing to increasing the refractive index of said substrate is diffused with the ion diffusion process or the diffusion copolymerization process, diffusion time or copolymerization time is controlled so that said microlenses are densely arranged on the surface of said substrate, and diffusion fronts of said microlenses come in contact in a linear form with, but are not fused with, diffusion fronts of adjoining microlenses.

6. A method of manufacturing a planar microlens array as set forth in claim 5, wherein the shape of said mask apertures is a square, hexagon or star shape.

2. A method of manufacturing a planar microlens array having a multitude of refractive-index distribution type microlenses of a polygonal circumferential shape arranged two-dimensionally and periodically on the surface of a planar transparent substrate, characterized in that said method includes the steps of:

preparing a planar transparent substrate,

forming on the surface of said substrate a diffusion-inhibiting mask film having a multitude of periodically arranged mask apertures of a shape connecting curves or broken lines passing inside straight lines that are parallel with and disposed at a predetermined interval inwardly away from sides of said polygonal circumferential shape, and

forming microlenses over the almost entire surface of said substrate by diffusing in said substrate a material contributing to increasing the refractive index of said substrate through said mask apertures.

7. A method of manufacturing a planar microlens array as set forth in claim 2, wherein the array of said mask apertures is a four-lobe array, said polygonal circumferential shape is a rectangle;

when said rectangle is expressed by four apexes A, B, C, and D, and an intersecting point O of diagonal lines AC and BD, each of said mask apertures has a shape expressed by straight lines connecting the following points P, Q, R, S, T, U, V, W and P in that order,

Point P;

a point on line segment AO at which distance L_AP from point A is such that 0.25L_AO ≦

L_AP ≦

0.67L_AO,

Point R;

a point on line segment BO at which distance L_BR from point B is such that L_BR =L_AP,

Point T;

a point on line segment CO at which distance L_CT from point C is such that L_CT =L_AP,

Point V;

a point on line segment DO at which distance L_DV from point D is such that L_DV =L_AP,

Point Q;

a point obtained by shifting point E, the bisecting point of line segment PR, by L_EQ, in the direction of point O where O<

L_EQ ≦

0.67 L_EQ,

Point S;

a point obtained by shifting point F, the bisecting point of line segment RT, by L_FS, in the direction of point O where O<

L_FS ≦

0.67 L_FO,

Point U;

a point obtained by shifting point G, the bisecting point of line segment TV, by L_GU, in the direction of point O where L_GU =L_EQ, and

Point W;

a point obtained by shifting point H, the bisecting point of line segment VP, by L_XW, in the direction of point O where L_HW =L_FS.

8. A method of manufacturing a planar microlens array as set forth in claim 7, wherein when the array of said mask-aperture is a four-lobe array, said rectangle is a square and L_EQ =L_FS.

9. A method of manufacturing a planar microlens array as set forth in claim 2, wherein the array of said mask apertures is a four-lobe array, said polygonal circumferential shape is a rectangle;

when said rectangle is expressed by four apexes A, B, C, and D, and an intersecting point O of diagonals AC and BD, each of said mask apertures has a shape enclosed by a curve connecting PQR, a curve connecting RST, a curve connecting TUV and a curve connecting VWP among the following points P, Q, R, S, T, U, V, and W,

Point P;

a point on line segment AO at which distance L_AP from point A is such that 0.25 L_AO ≦

L_AP ≦

0.67 L_AO,

Point R;

a point on line segment BO at which distance L_BR from point B is such that L_BR =L_AP,

Point T;

a point on line segment CO at which distance L_CT from point C is such that L_CT =L_AP,

Point V;

a point on line segment DO at which distance L_DV from point D is such that L_DV =L_AP,

Point Q;

a point obtained by shifting point E, the bisecting point of line segment PR, by L_EQ, in the direction of point O where O<

L_EQ ≦

0.67 L_EQ,

Point S;

a point obtained by shifting point F, the bisecting point of line segment RT, by L_FS, in the direction of point O where O<

L_FS ≦

0.67 L_FO,

Point U;

a point obtained by shifting point G, the bisecting point of line segment TV, by L_GU, in the direction of point O where L_GU =L_EQ, and

Point W;

a point obtained by shifting point H, the bisecting point of line segment VX, by L_HW, in the direction of point O where L_HW =L_FS.

10. A method of manufacturing a planar microlens array as set forth in claim 9, wherein said rectangle is a square and L_EQ =L_FS.

11. A method of manufacturing a planar microlens array as set forth in claim 2, wherein the array of said mask apertures is a sex-lobe array, said polygonal circumferential shape is a regular hexagonal;

when said regular hexagonal is expressed by six apexes A, B, C, D, E, and F, and a central point, each of said mask apertures has a shape expressed by straight lines connecting the following points P, Q, R, S, T, U, V, W, X, Y, Z, M, and P in that order,

Point P;

a point on line segment AO at which distance L_AP from point A is such that 0.25L_AO ≦

L_AP ≦

0.67 L_AO,

Point R;

a point on line segment BO at which distance L_BR from point B is such that 0.25 L_BO ≦

L_BR ≦

0.67 L_BO,

Point T;

a point on line segment CO at which distance L_CT from point C is such that 0.25 L_CO ≦

L_CT ≦

0.67 L_CO,

Point V;

a point on line segment DO at which distance L_DV from point D is such that L_DV =L_AP,

Point X;

a point on line segment EO at which distance L_EX from point E is such that L_EX =L_BR,

Point Z;

a point on line segment FO at which distance L_FZ from point F is such that L_FZ =L_CT,

Point Q;

a point obtained by shifting point E, the bisecting point of line segment PR, by L_EQ, in the direction of point O where O<

L_EQ ≦

0.5 L_EQ,

Point S;

a point obtained by shifting point F, the bisecting point of line segment RT, by L_FS, in the direction of point O where O<

L_FS ≦

0.5 L_FO,

Point U;

a point obtained by shifting point G, the bisecting point of line segment TV, by L_GU, in the direction of point O where O<

L_GU ≦

0.5 L_GO,

Point W;

a point obtained by shifting point H, the bisecting point of line segment VX, by L_HW, in the direction of point O where L_HW =L_EQ,

Point Y;

a point obtained by shifting point I, the bisecting point of line segment XZ, by L_IY, in the direction of point O where L_IY =L_FS, and

Point M;

a point obtained by shifting point J, the bisecting point of line segment ZP, by L_JM, in the direction of point O where L_JM =L_GU.

12. A method of manufacturing a planar microlens array as set forth in claim 2, wherein the array of said mask apertures is a sex-lobe array, said polygonal circumferential shape is a regular hexagonal;

when said regular hexagonal is expressed by six apexes A, B, C, D, E, and F, and O, each of said mask apertures has a shape enclosed by a curve connecting PQR, a curve connecting RST, a curve connecting TUV, a curve connecting VWX, a curve connecting XYZ, and a curve connecting ZMP from among the following points of P, Q, R, S, T, U, V, W, X, Y, Z, and M,

Point P;

a point on line segment AO at which distance L_AP from point A is such that 0.25 L_AO ≦

L_AP ≦

0.67 L_AO,

Point R;

a point on line segment BO at which distance L_BR from point B is such that 0.25 L_BO ≦

L_BR ≦

0.67 L_BO,

Point T;

a point on line segment CO at which distance L_CT from point C is such that 0.25 L_CO ≦

L_CT ≦

0.67 L_CO,

Point V;

a point on line segment DO at which distance L_DV from point D is such that L_DV =L_AP,

Point X;

a point on line segment EO at which distance L_EX from point E is such that L_EX =L_BR,

Point Z;

a point on line segment FO at which distance L_FZ from point F is such that L_FZ =L_CT,

Point Q;

a point obtained by shifting point E, the bisecting point of line segment PR, by L_EQ, in the direction of point O where O<

L_EQ ≦

0.5 L_EQ,

Point S;

a point obtained by shifting point F, the bisecting point of line segment RT, by L_FS, in the direction of point O where O<

L_FS ≦

0.5 L_FO,

Point U;

a point obtained by shifting point G, the bisecting point of line segment TV, by L_GU, in the direction of point O where O<

L_GU ≦

0.5 L_GO,

Point W;

a point obtained by shifting point H, the bisecting point of line segment VX, by L_HW, in the direction of point O where L_HW =L_EQ,

Point Y;

a point obtained by shifting point I, the bisecting point of line segment XZ, by L_IY, in the direction of point O where L_IY =L_FS, and

Point M;

a point obtained by shifting point J, the bisecting point of line segment ZP, by L_JM, in the direction of point O where L_JM =L_GU.

13. A method of manufacturing a planar microlens array as set forth in any one of claims 7 through 10, wherein the ratio of area occupied by said microlenses to the area of said substrate is more than 80% in the case where the circumferential shape of said mask apertures is a square, and more than 91% in the case where the aspect ratio of said microlenses is less than 2.

14. A method of manufacturing a planar microlens array having a multitude of refractive-index distribution type microlenses arranged two-dimensionally and periodically on the surface of a planar transparent substrate, characterized in that said method includes the steps of:

preparing a planar transparent substrate,

forming a diffusion-inhibiting mask film having a multitude of two-dimensionally and periodically arranged mask apertures on the surface of said substrate, and

forming microlenses on the surface of said substrate by diffusing in said substrate a substance contributing to increasing the refractive index of said substrate through said mask apertures, in such a manner that said microlenses are densely arranged on the surface of said substrate, diffusion fronts of said microlenses form regions where said diffusion fronts are fused with diffusion regions of adjoining microlenses, and the length, in the direction of a straight line connecting centers of adjoining two microlenses, of said regions where said two microlenses are fused together becoming less than 20% of an array pitch of said microlenses in said direction.

16. A method of manufacturing a planar microlens array as set forth in claim 14 or 15, wherein the circumferential shape of said microlenses is a polygon, the array of said microlenses being a four-lobe or six-lobe array.

17. A method of manufacturing a planar microlens array as set forth in claim 16, wherein said polygon is a rectangle or hexagon.

15. A method of manufacturing a planar microlens array having a multitude of refractive-index distribution type microlenses arranged two-dimensionally and periodically on the surface of a planar transparent substrate, characterized in that said method includes the steps of:

preparing a planar transparent substrate,

forming a diffusion-inhibiting mask film having a multitude of two-dimensionally and periodically arranged mask apertures on the surface of said substrate, and

forming microlenses on the surface of said substrate by diffusing in said substrate a substance contributing to increasing the refractive index of said substrate through said mask, in such a manner that said microlenses are densely arranged on the surface of said substrate, and diffusion fronts of said microlenses come in contact in a linear form with, but are not fused with, diffusion fronts of adjoining microlenses.

18. A method of manufacturing a planar microlens array having a multitude of refractive-index distribution type microlenses arranged two-dimensionally and periodically on the surface of a planar transparent substrate, characterized in that said method includes the steps of:

preparing a planar transparent substrate,

forming a diffusion inhibiting mask film having a multitude of two-dimensionally and periodically arranged mask apertures on the surface of said substrate, and

forming microlenses of a polygonal circumferential shape over the almost entire surface of said substrate by diffusing in said substrate a substance contributing to increasing the refractive index of said substrate through said mask apertures,

and wherein the shape of said mask apertures is set in said diffusion-inhibiting mask film forming step so that diffusion fronts corresponding to the sides of the microlenses being formed become linear.