Pressure-swing absorption based cleaning methods and systems

• US 5,881,577 A
• Filed: 09/09/1996
• Issued: 03/16/1999
• Est. Priority Date: 09/09/1996
• Status: Expired due to Fees

• Current Assignee: Air Liquide America LP (Mitsubishi Chemical Group Corp.)
• Original Assignee: Air Liquide America LP (Mitsubishi Chemical Group Corp.)
• Inventors: Connors, Robert W., Hubert, Jean-Luc, Sauer, Richard A.
• Primary Examiner(s): Houtteman, Scott W.
• Application Number:
  US08/709,656
• Time in Patent Office: 918 Days
• Field of Search: 68/5, 68/12.08, 68/12.09, 239/136
• US Class Current: 68/5.00R
• CPC Class Codes: D06F 43/00 Dry-cleaning apparatus or methods using volatile solvents D06F9/00 - D06F41/00 take precedence

Abstract

The cleaning process according to the present invention includes three main steps including supercritical extraction of soluble contaminants with a solvent composition, subcritical removal of particulate material with agitation, and solvent recovery and recycle. The supercritical extraction of soluble contaminants is performed by pumping a solvent composition into a cleaning vessel containing articles to be cleaned and pressurizing and heating the fluid in the vessel to a supercritical state. Then the subcritical phase is begun to remove particulate material from the articles by reducing the pressure and temperature of the solvent composition in the cleaning vessel to a subcritical state and reforming the liquid/gas interface. Agitation of the articles in the cleaning vessel is provided by recirculation of the solvent composition or by motion of a mechanical device within the cleaning vessel. Due to a density difference between gas and liquid in the subcritical phase, the degree of agitation and resultant particulate removal is maximized. The solvent composition recovery step preferably includes further depressurization of the fluid to separate and remove soluble and insoluble contaminants from the fluid, allowing this solvent composition to be reused. The system may be operated with any gas with suitable solvent properties such as carbon dioxide, carbon dioxide based mixtures, or other known solvents.

Claims

1. A method of cleaning articles by pressure swing absorption with a solvent composition comprising a supercritical fluid, the method comprising:

loading a pressure vessel with articles to be cleaned;

pressurizing and heating the solvent composition to a supercritical state of the solvent composition;

removing soluble contaminants from the articles by maintaining contact between the articles and the solvent composition in the supercritical state;

depressurizing and cooling the solvent composition within the pressure vessel to a subcritical state of the solvent composition;

removing particulate contaminants from the articles by agitating the articles and the solvent composition in the subcritical state within the pressure vessel;

removing the solvent composition from the pressure vessel; and

unloading the cleaned articles from the pressure vessel.

2. The method of cleaning articles according to claim 1, wherein the pressure vessel is pressurized with a carbon dioxide based solvent composition.

3. The method of cleaning articles according to claim 1, wherein the pressure vessel is pressurized with a solvent composition which includes at least one of a surfactant, a brightener, and a coupling agent.

4. The method of cleaning articles according to claim 1, wherein the pressure vessel is pressurized with a solvent composition which includes at least two solvents.

5. The method of cleaning articles according to claim 1, wherein at least a portion of the solvent composition is withdrawn from the pressure vessel and is recirculated back to the pressure vessel during the removal of soluble contaminants from the articles in the supercritical state.

6. The method of cleaning articles according to claim 5, wherein soluble contaminants are removed from the solvent composition continuously during said recirculation.

7. The method of cleaning articles according to claim 5, wherein soluble contaminants are removed from the solvent composition at a central location during the solvent removal step.

8. The method of cleaning articles according to claim 5, wherein the solvent composition is vented after a single use with or without separation of soluble contaminants.

9. The method of cleaning articles according to claim 1, wherein at least a portion of the solvent composition is withdrawn from the pressure vessel and recirculated back to the pressure vessel during the removal of particulate contaminants from the articles in the subcritical state.

10. The method of cleaning articles according to claim 9, wherein particulate contaminants are removed from the solvent composition continuously during said recirculation.

11. The method of cleaning articles according to claim 9, wherein particulate contaminants are removed from the solvent composition at a central location during the solvent removal step.

12. The method of cleaning articles according to claim 9, wherein the solvent composition is vented after a single use with or without separation of particulate contaminants.

13. The method of cleaning articles according to claim 6, wherein the removal of the soluble contaminants is by a method selected from the group consisting of distillation, carbon adsorption, and membrane separation.

14. The method of cleaning articles according to claim 7, wherein the removal of the soluble contaminants is by a method selected from the group consisting of distillation, carbon absorption, and membrane separation.

15. The method of cleaning articles according to claim 10, wherein the removal of particulate contaminants from the solvent composition is performed by filtration.

16. The method of cleaning articles according to claim 11, wherein the removal of particulate contaminants from the solvent composition is performed by filtration.

17. The method of cleaning articles according to claim 1, wherein the agitation is provided by recirculating the solvent composition and reinjecting the solvent composition to the pressure vessel in the form of a jet.

18. The method of cleaning articles according to claim 1, wherein the agitation is provided by mechanical motion of the pressure vessel.

19. The method of cleaning articles according to claim 18, wherein the pressure vessel is provided with stationary baffles to provide greater agitation.

20. The method of cleaning articles according to claim 1, wherein the agitation is provided by motion of a mechanical device within the pressure vessel.

21. The method of cleaning articles according to claim 1, wherein the heating of the solvent to a supercritical state and cooling of the solvent back to a subcritical state is performed outside of the pressure vessel.

22. The method of cleaning articles according to claim 1, further comprising performing a rinse cycle or a second washing cycle before the unloading of the cleaned articles from the pressure vessel.

23. A cleaning apparatus for cleaning articles with a solvent composition comprising a supercritical fluid, the system comprising:

a pressure vessel;

a solvent composition supply;

pressurization and heating means for pressurizing and heating the solvent composition to a supercritical state;

depressurization and cooling means for depressurizing and cooling the solvent composition to a subcritical state;

agitation means for agitating the solvent composition within the pressure vessel;

recovery means for recycling at least a portion of the solvent composition by removing contaminants from the solvent composition; and

control means for controlling the pressurization and heating means, the depressurization and cooling means, and the agitation means such that the system provides a first supercritical cleaning stage for removal of soluble contaminants and a second subcritical agitation cleaning stage for removal of particulate contaminants.

24. The cleaning apparatus according to claim 23, wherein the solvent composition supply includes a pressurized supply of a carbon dioxide based solvent.

25. The cleaning apparatus according to claim 23, further comprising a recirculation means for withdrawing the solvent composition from the pressure vessel and recirculating the solvent composition to the pressure vessel during the supercritical cleaning stage.

26. The cleaning apparatus according to claim 25, wherein the recirculation means includes a recovery system for removal of soluble contaminates from the solvent composition during recirculation.

27. The cleaning apparatus according to claim 25, wherein the recovery means removes soluble contaminants from the solvent composition at a central location.

28. The cleaning apparatus according to claim 25, further comprising a venting system for venting the solvent composition after a single use with or without separation of soluble contaminants.

29. The cleaning apparatus according to claim 23, further comprising a recirculation means for withdrawing the solvent composition from the pressure vessel and recirculating the solvent composition to the pressure vessel during the subcritical agitation cleaning stage.

30. The cleaning apparatus according to claim 29, wherein the recirculation means includes a recovery system for removal of particulate contaminants from the solvent composition during recirculation.

31. The cleaning apparatus according to claim 29, wherein the recovery means removes particulate contaminants from the solvent composition at a central location.

32. The cleaning apparatus according to claim 29, further comprising a venting system for venting the solvent composition after a single use with or without separation of particulate contaminants.

33. The cleaning apparatus according to claim 26, wherein the recovery system removes the soluble contaminants by a method selected from the group consisting of distillation, carbon adsorption, and membrane separation.

34. The cleaning apparatus according to claim 27, wherein the recovery system removes the soluble contaminants by a method selected from the group consisting of distillation, carbon absorption, and membrane separation.

35. The cleaning apparatus according to claim 30, wherein the recovery system removes the particulate contaminants from the solvent composition by filtration.

36. The cleaning apparatus according to claim 23, wherein the agitation means includes a drive device mounted on the outside of the pressure vessel for moving the pressure vessel.

37. The cleaning apparatus according to claim 36, wherein the pressure vessel is provided with interior stationary baffles to provide greater agitation.

38. The cleaning apparatus according to claim 23, wherein the agitation means includes a mechanical device within the pressure vessel.

39. The cleaning apparatus according to claim 23, wherein a plurality of pressure vessels are provided for performing separate cleaning operations.

40. The cleaning apparatus according to claim 23, further comprising a blow down drain within the solvent composition supply for removal of contaminants which are separated from the solvent composition.

41. The cleaning apparatus according to claim 23, further comprising a purging system for purging the pressure vessel after articles to be cleaned have been placed within the pressure vessel.

42. The cleaning apparatus according to claim 23, wherein the control means includes separate controllers for controlling the pressurization and heating means, the depressurization and cooling means, and the agitation means.

43. A cleaning apparatus for cleaning articles with a solvent composition comprising a supercritical fluid, the is system comprising:

a pressure vessel;

a solvent composition supply;

pressurization and heating means for pressurizing and heating the solvent composition to a supercritical state;

depressurization and cooling means for depressurizing and cooling the solvent composition to a subcritical state;

agitation means for agitating the solvent composition within the pressure vessel; and

control means for controlling the pressurization and heating means, the depressurization and cooling means, and the agitation means such that the system provides a first supercritical cleaning stage for removal of soluble contaminants and a second subcritical agitation cleaning stage for removal of particulate contaminants.