Method of holding substrate and substrate holding system
First Claim
1. A substrate holding system for holding a substrate on a specimen table, and supplying a back side gas between the specimen table and said substrate, which comprises:
- a periphery holding portion having a surface disposed on said specimen table in a position corresponding to the periphery of said substrate;
an internal holding portion disposed on said specimen table to support said substrate at a corresponding position between the periphery of said substrate and the center of said substrate; and
electrostatic attraction means for fixing said substrate on said holder so that the back surface of said substrate contacts the periphery holding portion and the internal holding portion,wherein the back side gas is supplied through a feed hole located in a recessed portion of the specimen table;
wherein the internal holding portion includes a through hole and a pin for pushing the substrate off of the specimen table.
0 Assignments
0 Petitions
Accused Products
Abstract
In a method of holding a substrate and a substrate holding system where, the amount of foreign substances on the back surface of the substrate can be decreased and only a small amount of foreign substances transferred from a mounting table to the substrate. For this purpose, the substrate holding system has a ring-shaped leakage-proof surface providing a smooth support surface on the specimen table corresponding to the periphery of the substrate, a plurality of contact holding portions which bear against the substrate on the specimen table between the corresponding position to the periphery of the substrate and the corresponding position to the center of the substrate, and electrostatic attraction means for fixing the substrate by contacting the back surface of the substrate to the ring-shaped leakage-proof surface and the contact holding portions. The substrate is exposed to a cooling surface at the ring-shaped leakage-proof surface and the contact holding portion placed at a position inside the ring-shaped leakage-proof surface. The back surface of the substrate and the cooling surface do not contact each other in the large portion of the remaining area.
51 Citations
21 Claims
-
1. A substrate holding system for holding a substrate on a specimen table, and supplying a back side gas between the specimen table and said substrate, which comprises:
-
a periphery holding portion having a surface disposed on said specimen table in a position corresponding to the periphery of said substrate; an internal holding portion disposed on said specimen table to support said substrate at a corresponding position between the periphery of said substrate and the center of said substrate; and electrostatic attraction means for fixing said substrate on said holder so that the back surface of said substrate contacts the periphery holding portion and the internal holding portion, wherein the back side gas is supplied through a feed hole located in a recessed portion of the specimen table; wherein the internal holding portion includes a through hole and a pin for pushing the substrate off of the specimen table. - View Dependent Claims (2, 3, 4)
-
-
5. A substrate holding system in a plasma treatment apparatus having a vacuum treating chamber, gas introducing means and a specimen table mounting a substrate in the vacuum treating chamber where the substrate is held to the specimen table with electrostatic adhesion force, comprising:
-
a periphery holding portion having a surface protruding from a holding member in a position corresponding to the periphery of the substrate; and an internal holding portion disposed on said holding member to support said substrate at a corresponding position between the periphery of said substrate and the center of said substrate; wherein said substrate holding system further comprises; electrostatic attraction means for fixing said substrate on said holder so that the back surface of said substrate contacts the periphery holding portion and the internal holding portion, wherein the back side gas is supplied through a feed hole located in a recessed portion of the specimen table; and wherein the internal holding portion has a through hole and a pin for pushing the substrate off of the specimen table. - View Dependent Claims (6)
-
-
7. A substrate holding system which holds a substrate on a specimen table, and supplies a back side gas between the specimen table and said substrate, which comprises:
-
a periphery holding portion having a surface disposed on said specimen table in a position corresponding to the periphery of said substrate; an internal holding portion disposed on said specimen table to support said substrate at a corresponding position between the periphery of said substrate and the center of said substrate; and electrostatic attraction circuitry to generate electrostatic attraction at the specimen table to fix said substrate on said holder so that the back surface of said substrate contacts the periphery holding portion and the internal holding portion, wherein the back side gas is supplied through a feed hole located in a recessed portion of the specimen table, and wherein the internal holding portion includes a through hole and a pin to push the substrate off the specimen table. - View Dependent Claims (8, 9)
-
-
10. A substrate holding system for holding a substrate on a specimen table, and supplying a back side gas between the specimen table and said substrate, which comprises:
-
a periphery holding portion having a surface disposed on said specimen table in a position corresponding to the periphery of said substrate; an internal holding portion disposed on said specimen table to support said substrate at a corresponding position between the periphery of said substrate and the center of said substrate, wherein the internal holding portion is separated from the periphery holding portion by a recessed portion in the specimen table; and electrostatic attraction means for fixing said substrate on said holder so that the back surface of said substrate contacts the periphery holding portion and the internal holding portion, wherein the internal holding portion includes a through hole and a pin for pushing the substrate off of the specimen table. - View Dependent Claims (11, 12, 13, 14)
-
-
15. A substrate holding system in a plasma treatment apparatus having a vacuum treating chamber, gas introducing means and a specimen table mounting a substrate in the vacuum treating chamber where the substrate is held to the specimen table with electrostatic adhesion force, comprising:
-
a periphery holding portion having a surface protruding from a holding member in a position corresponding to the periphery of the substrate; and an internal holding portion disposed on said holding member to support said substrate at a corresponding position between the periphery of said substrate and the center of said substrate, wherein the internal holding portion is separated from the periphery holding portion by a recessed portion in the specimen table; wherein said substrate holding system further comprises; electrostatic attraction means for fixing said substrate on said holder so that the back surface of said substrate contacts the periphery holding portion and the internal holding portion, wherein the internal holding portion has a through hole and a pin for pushing the substrate off of the specimen table. - View Dependent Claims (16, 17)
-
-
18. A substrate holding system which holds a substrate on a specimen table, and supplies a back side gas between the specimen table and said substrate, which comprises:
-
a periphery holding portion having a surface disposed on said specimen table in a position corresponding to the periphery of said substrate; an internal holding portion disposed on said specimen table to support said substrate at a corresponding position between the periphery of said substrate and the center of said substrate, wherein the internal holding portion is separated from the periphery holding portion by a recessed portion in the specimen table; and electrostatic attraction circuitry to generate electrostatic attraction at the specimen table to fix said substrate on said holder so that the back surface of said substrate contacts the periphery holding portion and the internal holding portion, wherein the internal holding portion includes a through hole and a pin to push the substrate off the specimen table. - View Dependent Claims (19, 20, 21)
-
Specification