Scratch reduction in semiconductor circuit fabrication using chemical-mechanical polishing
First Claim
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1. A process for planarizing a layer on a substrate, comprising the steps of:
- a first polishing step comprising polishing said layer on a first polishing pad;
a second polishing step comprising polishing said layer on a second polishing pad having a higher compressibility than said first polishing pad at an effective pressure to reduce scratches in said layer; and
a third rising step comprising rinsing said layer on said second polishing pad using water.
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Abstract
A process for polishing a layer on a semiconductor wafer in which the incidence of undesirable scratches on the polished surface is reduced by using a multiple step polishing procedure. A relatively hard polishing pad is used first to planarize the wafer surface, using a chemically reactive and abrasive slurry. A second polishing step is then carried out on a relatively soft polishing pad, using a slurry to remove or reduce scratches introduced by polishing with the hard pad. A final polishing step is performed on the soft polishing pad using de-ionized water to remove particles from the surface of the wafer.
87 Citations
25 Claims
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1. A process for planarizing a layer on a substrate, comprising the steps of:
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a first polishing step comprising polishing said layer on a first polishing pad; a second polishing step comprising polishing said layer on a second polishing pad having a higher compressibility than said first polishing pad at an effective pressure to reduce scratches in said layer; and a third rising step comprising rinsing said layer on said second polishing pad using water. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21)
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22. A process for planarizing a layer on a substrate, comprising the steps of:
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a first polishing step comprising polishing said layer on a first polishing pad using a first slurry; a second polishing step comprising polishing said layer on a second polishing pad having a higher compressibility than said first polishing pad using a second slurry at a pressure effective to remove or reduce scratches in said layer; and a third rinsing step comprising rinsing said wafer on a soft polishing pad using water. - View Dependent Claims (23, 24)
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25. A substrate having a layer planarized by a process comprising the following steps:
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a first polishing step comprising polishing said layer on a first polishing pad using a first slurry having a first polishing reagent; a second polishing step comprising polishing said layer on a second polishing pad having a higher compressibility than said first polishing pad using a second slurry, at a pressure effective to reduce scratches in said layer; and a third rinsing step comprising rinsing said layer on said second polishing pad using water.
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Specification