Spark eliminating sputtering target and method for using and making same

  • US 5,922,176 A
  • Filed: 06/12/1992
  • Issued: 07/13/1999
  • Est. Priority Date: 06/12/1992
  • Status: Expired due to Fees
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First Claim
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1. A substantially nonsparking magnetron sputtering target having regions of sputtering and nonsputtering for a direct current sputtering process, comprising:

  • an electrically conducting magnetron target material for use in a magnetron sputtering process;

    insulation means for electrically insulating said nonsputtering regions of said magnetron target from a sputtering gas plasma created during said magnetron sputtering process, said insulation means selected from the group consisting of

         1) a substantially nonsputtering, electrically insulating material substituted for said nonsputtering regions of said target, and

         2) a substantially nonsputtering, electrically insulating material covering said nonsputtering regions of said target which are exposed to said gas plasma during sputtering, said insulation means being of sufficient thickness to substantially prevent catastrophic sparking during sputtering; and

    a layer of support material over said coating of said electrically insulating material.

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