×

Silicon layer arrangement for last mask programmability

  • US 5,926,419 A
  • Filed: 07/15/1997
  • Issued: 07/20/1999
  • Est. Priority Date: 06/07/1995
  • Status: Expired due to Fees
First Claim
Patent Images

1. A method for fabricating an application specific integrated circuit, comprising:

  • a. forming the application specific integrated circuit from a multitude of silicon layers, including upper silicon layers and lower silicon layers;

    b. forming a processor for performing defined calculations, and a random access memory for storing a plurality of variable data values, in the lower layers of the application specific integrated circuit; and

    c. forming a read only memory in the upper layers of the application specific integrated circuit; and

    d. storing a plurality of control functions and constant data values in the read only memory in the upper layers of the application specific integrated circuit.

View all claims
  • 4 Assignments
Timeline View
Assignment View
    ×
    ×