Methods for centrifugally cleaning wafer carriers

  • US 5,972,127 A
  • Filed: 11/26/1997
  • Issued: 10/26/1999
  • Est. Priority Date: 06/15/1992
  • Status: Expired due to Term
First Claim
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1. A process for cleaning carriers used to hold semiconductor articles comprising the steps of:

  • loading at least one corner upon a rotor within a processing chamber;

    rotating the rotor with the at least one carrier supported thereon;

    spraying cleaning liquid upon the at least one carrier, said spraying occurrg during at least a portion of said rotating;

    flowing primary drying gas in a generally downwardly direction through the processing chamber; and

    jetting secondary drying gas upon the at least one carrier.

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