Vacuum assisted debris removal system

  • US 5,973,764 A
  • Filed: 06/19/1997
  • Issued: 10/26/1999
  • Est. Priority Date: 06/19/1997
  • Status: Expired due to Fees
First Claim
Patent Images

1. A vacuum assisted debris removal system for use in photolithography comprising:

  • a manifold having a planar top surface and a planar bottom surface and an illumination field opening, said manifold placed between a lens element having a surface and a photosensitive resist covered substrate forming a first gap between the surface of the lens element and the planar top surface of said manifold and a second gap between the planar bottom surface of said manifold and a photosensitive resist covered substrate, said manifold having bores open and adjacent to the illumination field opening, said manifold positioned to establish a first flow pattern in the first gap across the surface of the lens element and towards the photosensitive resist covered substrate, and a second flow pattern in the second gap across the photosensitive resist covered substrate and towards the illumination field opening, anda vacuum source coupled to said manifold,whereby a flow pattern is obtained preventing the lens element from being coated with debris.

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