Solid state imaging device and production method for the same

  • US 5,976,907 A
  • Filed: 01/09/1998
  • Issued: 11/02/1999
  • Est. Priority Date: 05/02/1995
  • Status: Expired due to Term
First Claim
Patent Images

1. A production method for a solid state imaging device comprising:

  • a resist coating step of coating light receiving portions formed on a semiconductor substrate with a lens resin;

    a patterning step of making the lens resin into desired patterns so as to form lens patterns; and

    a lens forming step of forming micro lenses for collecting light on the light receiving portions by heating the lens patterns,wherein the lens forming step includes a step of forming the micro lenses at a temperature lower than a temperature at which the lens patterns are substantially completely melted.

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