Composition and slurry useful for metal CMP
DC CAFCFirst Claim
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1. A chemical mechanical polishing composition comprising the admixture of:
- a first component including at least one oxidizing agent; and
a second component that includes the product of the mixture of at least one catalyst having multiple oxidation states and at least one stabilizer.
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Abstract
A chemical mechanical polishing composition comprising an oxidizing agent at least one catalyst having multiple oxidation states, and at least one stabilizer, the composition being useful when combined with an abrasive or with an abrasive pad to remove metal layers from a substrate.
148 Citations
26 Claims
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1. A chemical mechanical polishing composition comprising the admixture of:
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a first component including at least one oxidizing agent; and a second component that includes the product of the mixture of at least one catalyst having multiple oxidation states and at least one stabilizer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
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15. A chemical mechanical polishing slurry comprising:
- from about 3.0 to about 7.0 weight percent silica;
from about 0.5 to about 10.0 weight percent hydrogen peroxide; and
the product of the mixture of from about 0.01 to about 0.05 weight percent ferric nitrate catalyst and from about 2 equivalents per catalyst to about 15 equivalents per catalyst of malonic acid. - View Dependent Claims (16)
- from about 3.0 to about 7.0 weight percent silica;
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17. A method for polishing a substrate including at least one metal layer comprising the steps of:
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(a) preparing an admixture of a first component including at least one oxidizing agent, and a second component including the product of the mixture of at least one catalyst having multiple oxidation states and at least one stabilizer, and deionized water to produce a chemical mechanical polishing composition; (b) applying the chemical mechanical polishing composition to the substrate; and (c) removing at least a portion of the metal layer from the substrate by bringing a pad into contact with the substrate and moving the pad in relation to the substrate. - View Dependent Claims (18, 19, 20, 21, 22, 23, 24, 25, 26)
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Specification