Composition and slurry useful for metal CMP

  • US 5,980,775 A
  • Filed: 04/08/1997
  • Issued: 11/09/1999
  • Est. Priority Date: 11/26/1996
  • Status: Expired due to Term
First Claim
Patent Images

1. A chemical mechanical polishing composition comprising the admixture of:

  • a first component including at least one oxidizing agent; and

    a second component that includes the product of the mixture of at least one catalyst having multiple oxidation states and at least one stabilizer.

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