Optical semiconductor device and a method of manufacturing the same
First Claim
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1. An optical semiconductor device comprising an optical beam diameter converting waveguide including:
- a semiconductor substrate;
a quantum well layer formed above the semiconductor substrate, the quantum well layer having at least one well layer and two barrier layers sandwiching the well layer, and the quantum well layer forming at least a part of a core layer of the optical beam diameter converting waveguide, wherein each of the well layer and the barrier layers reduce their film thickness gradually from a first end to a second end of the quantum well layer; and
a cladding layer covering the quantum well layer;
wherein the quantum well layer increases in width thereof gradually from the first end to the second end of the quantum well layer.
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Abstract
An optical semiconductor device of the present invention is provided with a core layer having a quantum well layer in that film thickness gets thinner from a inner region to an end portion in an optical waveguide region.
75 Citations
33 Claims
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1. An optical semiconductor device comprising an optical beam diameter converting waveguide including:
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a semiconductor substrate; a quantum well layer formed above the semiconductor substrate, the quantum well layer having at least one well layer and two barrier layers sandwiching the well layer, and the quantum well layer forming at least a part of a core layer of the optical beam diameter converting waveguide, wherein each of the well layer and the barrier layers reduce their film thickness gradually from a first end to a second end of the quantum well layer; and a cladding layer covering the quantum well layer; wherein the quantum well layer increases in width thereof gradually from the first end to the second end of the quantum well layer.
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2. An optical semiconductor device comprising an optical beam diameter converting waveguide including:
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a semiconductor substrate; a quantum well layer formed above the semiconductor substrate, the quantum well layer having at least one well layer and two barrier layers sandwiching the well layer, and the quantum well layer forming at least a part of a core layer of the optical beam diameter converting waveguide, wherein each of the well layer and the barrier layers reduce their film thickness gradually from a first end to a second end of the quantum well layer; and a cladding layer covering the quantum well layer; wherein a thickness of the quantum well layer at the first end is at least twice as that of the quantum well layer at the second end. - View Dependent Claims (3, 4, 6, 7, 8, 9, 10)
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5. An optical semiconductor device comprising an optical beam diameter converting waveguide including:
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a semiconductor substrate; a quantum well layer formed above the semiconductor substrate, the quantum well layer having at least one well layer and two barrier layers sandwiching the well layer, and the quantum well layer forming at least a part of a core layer of the optical beam diameter converting waveguide, wherein each of the well layer and the barrier layers reduce their film thickness gradually from a first end to a second end of the quantum well layer; a cladding layer covering the quantum well layer; a first guide layer formed between the semiconductor substrate and the quantum well layer; and a second guide layer formed between the quantum well layer and the cladding layer; wherein said first and second guide layers having an energy band gap which is larger than that of a well layer and lower than those of the semiconductor substrate and the cladding layer; wherein the first and the second guide layers reduce their film thickness gradually from the first end to the second end of the quantum well layer.
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11. An optical semiconductor device, comprising:
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a semiconductor substrate; a quantum well layer formed above the semiconductor substrate, the quantum well layer having an optical active region and a wave guide region and including at least one well layer and two barrier layers sandwiching the well layer, and the quantum well layer forming at least a part of a core layer of a wave guide, wherein the well layer in the wave guide region reduces its film thickness gradually from a first end of the wave guide region adjacent to the optical active region to a second end of the wave guide region; a first cladding layer covering the quantum well layer; a first electrode formed above the first cladding layer and over the optical active region; and a second electrode formed on an under surface of the substrate under the optical active region; a second cladding layer formed between the semiconductor substrate and the quantum well layer; a first guide layer formed between the second cladding layer and the quantum well layer; and a second guide layer formed between the quantum well layer and the first cladding layer; wherein said first and second guide layers have an energy band gap which is larger than that of the well layer and lower than those of the first and the second cladding layers, and the first and the second guide layers reduce their film thickness gradually from the first end to the second end.
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12. An optical semiconductor device comprising:
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a semiconductor substrate; a quantum well layer formed above the semiconductor substrate, the quantum well layer having an optical active region and a wave guide region and including at least one well layer and two barrier layers sandwiching the well layer, and the quantum well layer forming at least a part of a core layer of a wave guide, wherein the well layer in the wave guide region reduces its film thickness gradually from a first end of the wave guide region adjacent to the optical active region to a second end of the wave guide region; a first cladding layer covering the quantum well layer; a first electrode formed above the first cladding layer and over the optical active region; and a second electrode formed on an under surface of the substrate under the optical active region; wherein the quantum well layer of the wave guide region increases in width gradually from the first end to the second end.
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13. An optical semiconductor device comprising:
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a semiconductor substrate; a quantum well layer formed above the semiconductor substrate, the quantum well layer having an optical active region and a wave guide region and including at least one well layer and two barrier layers sandwiching the well layer, and the quantum well layer, forming at least a part of a core layer of a wave guide, wherein the well layer in the wave guide region reduced its film thickness gradually from a first end of the wave guide region adjacent to the optical active region to a second end of the wave guide region; a first cladding layer covering the quantum well layer; a first electrode formed above the first cladding layer and over the active region; a second electrode formed on an under surface of the substrate under the optical active region; wherein a thickness of the quantum well at the first end is at least twice that at the second end. - View Dependent Claims (14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33)
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Specification