×

Method for changing the weight of a synaptic element

  • US 6,023,422 A
  • Filed: 09/29/1998
  • Issued: 02/08/2000
  • Est. Priority Date: 05/06/1992
  • Status: Expired due to Term
First Claim
Patent Images

1. In an array of N-channel MOS transistors formed in a p-type substrate, said N-channel MOS transistors each including a drain electrode, a source electrode, a control gate and a floating gate on which electrons may be stored to establish a floating gate potential, said array arranged in rows and columns and having a unique row line associated with each row of said array and a unique column line associated with each column of said array, said source electrodes of all of said N-channel MOS transistors in a row connected to said unique row line associated with that row and said drain electrodes of all of said N-channel MOS transistors in a column are connected to said unique column line associated with said column, a method for selectively decreasing said floating gate potential of a selected one of one of said N-channel MOS transistors comprising the steps of:

  • injecting minority electrons into said substrate;

    applying a positive potential of at least 3.2 volts to the one of said row lines and the one of said column lines associated with said selected one of said N-channel MOS transistors while simultaneously maintaining all other ones of said row and column lines at voltages less than less than about 1.5 volts.

View all claims
  • 2 Assignments
Timeline View
Assignment View
    ×
    ×