Cross flow centrifugal processor

• US 6,062,239 A
• Filed: 06/30/1998
• Issued: 05/16/2000
• Est. Priority Date: 06/30/1998
• Status: Expired due to Term

• Current Assignee: OEM Group, LLC
• Original Assignee: Semitool Incorporated (Applied Materials Incorporated)
• Inventors: Bexten, Daniel P.
• Primary Examiner(s): Stinson, Frankie L.
• Application Number:
  US09/108,162
• Time in Patent Office: 686 Days
• Field of Search: 134/163, 134/157, 134/148, 134/902, 134/102.3, 134/95.2, 134/25.4, 134/30
• US Class Current: 134/25.4
• CPC Class Codes: F26B 5/08 by centrifugal treatment
• CPC Class Codes: G03F 7/162 Coating on a rotating support, e.g. using a whirler or a spinner
• CPC Class Codes: H01L 21/67034 for drying

Abstract

A centrifugal processor for processing flat media, such as silicon wafers, has a rotor rotatably mounted within a rotor housing. Fan blades on the rotor blow air over the wafers, to move any remaining fluid droplets away from the wafer centers, to allow centrifugal force to fling the fluid droplets off of the wafers. The centrifugal processor uses clean room air, rather than nitrogen, for drying. Operating costs are reduced while manufacturing yields are increased, as spotting at the wafer centers is avoided.

Claims

1. A centrifugal processor, comprising:

a rotor housing;

a rotor rotatably mounted within the rotor housing;

a flat media holder; and

a plurality of fan blades positioned on the rotor to blow ambient gas within the rotor housing, over the flat media.

2. The centrifugal processor of claim 1 wherein the flat media holder is a cassette holder.

3. The centrifugal processor of claim 2 further comprising means for spinning the rotor about a spin axis, and semiconductor material wafers held in a cassette in the cassette holder, with the wafers centered on the spin axis.

4. The centrifugal processor of claim 1 further comprising an inlet attached near an upper end of the rotor housing and an outlet attached near a lower end of the rotor housing.

5. The centrifugal processor of claim 4 further comprising a source of clean room air leading into the inlet duct.

6. The centrifugal processor of claim 4 further comprising a processor housing having a top and a bottom and containing the rotor housing and having an inlet duct extending from near the top of the processor housing to the inlet of the rotor housing and an outlet duct extending from the outlet of the rotor housing to near the bottom of the processor housing.

7. The centrifugal processor of claim 1 wherein the rotor is rotatable about a spin axis, and the fan blades extend parallel to the spin axis.

8. The centrifugal processor of claim 1 wherein the rotor and rotor housing are generally cylindrical, and the rotor is centered within the rotor housing.

9. The centrifugal processor of claim 8 wherein the rotor housing has an interior cylindrical wall spaced apart from the rotor by 5-40 mm.

10. The centrifugal processor of claim 1 further comprising a filter in a rotor housing inlet on the rotor housing.

11. The centrifugal processor of claim 1 wherein the rotor comprises a front ring and a back ring and the fan blades extend perpendicularly between the front ring and the back ring.

12. The centrifugal processor of claim 1 wherein the blades have a concave surface facing the flat media holder.

13. The centrifugal processor of claim 1 wherein the rotor housing has an open front end and a closed back end.

14. The centrifugal processor of claim 1 further comprising a spray manifold adjacent to the rotor, for spraying water, solvent or acid towards the rotor.

15. A method for processing flat media, comprising the steps of:

loading the flat media into a centrifugal processor in a clean room;

drawing clean room air into the centrifugal processor;

blowing the clean room air over the flat media; and

blowing the clean room air back into the clean room.

16. The method of claim 15 further comprising the step of spinning a rotor inside the dryer carrying the flat media, to blow the clean room air over the wafers.

17. A centrifugal processor, comprising:

a processor housing;

a rotor housing within the processor housing;

a rotor within the rotor housing and rotatable mounted therein about a rotational axis;

holding means, within the rotor, for holding a plurality of flat media;

air moving means on the rotor for blowing air over the flat media with rotation of the rotor; and

means for rotating the rotor about the rotational axis.

18. The centrifugal processor of claim 17 wherein the flat media are silicon wafers.

19. A centrifugal processor, comprising:

a rotor housing;

a rotor rotatably mounted within the rotor housing;

a flat media holder within the rotor for holding an array of flat media in a fixed upright position; and

a plurality of fan blades positioned on the rotor to blow ambient gas within the rotor housing over flat media held in the flat media holder.

20. The processor of claim 19 wherein the rotor and any flat media in the rotor have a spin axis extending upwardly at 5-35°

from horizontal.

21. A centrifugal processor, comprising:

a rotor housing;

a rotor rotatably mounted within the rotor housing;

a flat media holder within the rotor;

a plurality of fan blades on the rotor; and

a filter in a rotor housing inlet on the rotor housing.

22. A centrifugal processor, comprising:

a rotor housing;

a rotor rotatably mounted within the rotor housing;

a flat media holder within the rotor;

an inlet attached near an upper end of the rotor housing and an outlet attached near a lower end of the rotor housing;

a source of clean room air leading into the inlet; and

a plurality of fan blades on the rotor.

23. A centrifugal processor, comprising:

a rotor housing;

a rotor rotatably mounted within the rotor housing;

a flat media holder within the rotor; and

a plurality of fan blades on the rotor positioned to blow air over both sides of the flat media.