Microlens scanner for microlithography and wide-field confocal microscopy

• US 6,133,986 A
• Filed: 02/20/1997
• Issued: 10/17/2000
• Est. Priority Date: 02/28/1996
• Status: Expired due to Term

• Current Assignee: Kenneth C. Johnson
• Original Assignee: Kenneth C. Johnson
• Inventors: Johnson, Kenneth C.
• Primary Examiner(s): Epps, Georgia
• Assistant Examiner(s): Thompson, Timothy J.
• Application Number:
  US08/803,096
• Time in Patent Office: 1,335 Days
• Field of Search: 355/53, 355/43, 355/77
• US Class Current: 355/67
• CPC Class Codes: G02B 21/0028 specially adapted for specific applications, e.g. for endoscopes, ophthalmoscopes, attachments to conventional microscopes
• CPC Class Codes: G02B 21/0044 moving apertures, e.g. Nipkow disks, rotating lens arrays
• CPC Class Codes: G03F 7/70091 Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
• CPC Class Codes: G03F 7/70241 Optical aspects of refractive lens systems, i.e. comprising only refractive elements
• CPC Class Codes: G03F 7/70275 Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
• CPC Class Codes: G03F 7/70358 Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging

Abstract

A microscopy and/or lithography system uses a comparatively low-resolution image projection system, which has a very small numerical aperture but large image field, in conjunction with a microlens array comprising miniature lens elements, each of which has a large numerical aperture but very small field. The projection system contains a small aperture stop which is imaged by the microlenses onto an array of diffraction-limited microspots on the microscope sample or printing surface at the microlens focal point positions, and the surface is scanned to build up a complete raster image from the focal point array. The system design thus circumvents the tradeoff between image resolution and field size which is the source of much of the complexity and expense of conventional wide-field, high-NA microscopy and microlithography systems. The system makes possible flat field, distortion-free imaging, with accurate overlay, focus, and warp compensation, over very large image fields (larger than the practical limits of conventional imaging means). In one embodiment it would use a Digital Micromirror Device as the image source, potentially eliminating the need for photomasks in semiconductor manufacture.

Claims

1. A printing system comprising:

an optical projection system having an object plane, an image plane which is conjugate to the object plane, and a limiting aperture stop which is referred to as the projection aperture;

a planar array of microlenses having respective apertures defining a microlens aperture array, wherein the aperture array is positioned at the projection system'"'"'s image plane, and wherein the microlenses have respective focal points which are conjugate to the projection aperture and which define a focal point array;

a scanning mechanism which establishes relative motion between the the microlens array and a printing surface proximate the focal point array, wherein the paths traversed by the focal points relative to the printing surface comprise a set of closely-spaced raster lines;

an image source comprising an array of light-modulating image source elements, wherein the image source is positioned at the projection system'"'"'s object plane, and wherein the projection system images each image source element onto a corresponding microlens aperture and the image source element thus controls the light level over a microspot on the printing surface, proximate the corresponding microlens focal point; and

an image modulation mechanism that controls the image source as the printing surface is scanned, whereby, when a photosensitive material is positioned in the printing surface, a synthesized, high-resolution raster image is recorded on the photosensitive material.

2. The printing system of claim 1 wherein the photosensitive material is photoresist on a planar substrate.

3. The printing system of claim 2 wherein the substrate is a semiconductor wafer.

4. The printing system of claim 1 wherein the projection aperture size and shape are determined so that the diffraction-limited amplitude distribution produced by each image source element on its corresponding microlens aperture has nodes on adjacent microlens apertures, whereby light leakage into adjacent microlenses is minimized.

5. The printing system of claim 1 wherein the projection aperture is apodized to minimize light leakage into adjacent microlens apertures.

6. The printing system of claim 1, further comprising an illumination system which illuminates the image source, wherein the illumination is modulated by the image source elements and is transmitted by the projection system and microlens array onto the printing surface.

7. The printing system of claim 6 wherein:

the scanning mechanism of claim 1 defines a first scanning mechanism, and the illumination system further comprises a second scanning mechanism;

the illumination system illuminates only a narrow band, or set of parallel bands, on the image source and on the microlens array at any particular instant in time; and

the second scanning mechanism repeatedly scans the illumination band or bands across the image field in synchronization with the first scanning mechanism so that each microspot is only illuminated during a very brief time interval during which it is traversed by an illumination band, therby minimizing smearing of the exposure pattern on the printing surface due to the relative motion between the printing surface and the microlens array.

8. The printing system of claim 6 wherein the image source comprises a light-transmitting optical medium, the illumination system illuminates the image source in transmission mode, and the image source elements comprise respective zones on the optical medium having differing optical transmittance characteristics.

9. The printing system of claim 6 wherein the image source comprises a light-reflecting optical medium, the illumination system illuminates the image source in reflection mode, and the image source elements comprise respective zones on the optical medium having differing optical reflectance characteristics.

10. The printing system of claim 9 wherein the image source comprises a digital micromirror device (DMD) and the projection system is telecentric on the object side.

11. The printing system of claim 9, further comprising a beam splitter disposed to merge light from the illumination system into the projection system'"'"'s light path so that the light, so merged, and the image light reflected from the image source traverse the same optical path between the beam splitter and the image source.

12. The printing system of claim 9 wherein the illumination system comprises an off-axis illumination source adjacent the projection aperture.

13. The printing system of claim 12 wherein the illumination source comprises a fiber optic illuminator.

14. The printing system of claim 12 wherein:

the microlens array defines a first microlens array;

the image source further comprises a digital micromirror device (DMD), and a second microlens array disposed proximate the DMD;

each image source element comprises corresponding first and second microlenses of the second microlens array and a corresponding micromirror of the DMD;

the projection system is telecentric on the object side;

the second microlens array is disposed in the projection system'"'"'s object plane;

each image source element'"'"'s corresponding first microlens focuses the illumination source to a corresponding first illumination image point proximate the corresponding micromirror;

each image source element'"'"'s corresponding micromirror has tilt control and built-in optical power so that, when the micromirror is in its "on" state,

the corresponding first illumination image point is reimaged by the micromirror to a corresponding second illumination image point at the center of the corresponding second microlens'"'"'s aperture, and

the corresponding first microlens'"'"'s aperture is imaged by the micromirror to a corresponding aperture image proximate the micromirror;

each image source element'"'"'s corresponding second illumination image point is reimaged by the projection system onto the corresponding microlens aperture of the first microlens array;

each image source element'"'"'s corresponding second microlens images the corresponding aperture image onto the projection aperture; and

each image source element'"'"'s corresponding micromirror is tilted, when in its "off" position, to divert the illumination light intercepted by the corresponding first microlens out of the projection aperture;

wherein the optical power in the DMD micromirror elements and in the second microlens array elements, and the separation distance between the DMD and the second microlens array, are selected to balance the tradeoffs relating to the micromirrors'"'"' aperture size requirement and surface form tolerance, the micromirror tilt range and tilt tolerance, energy efficiency, and image cross-talk.

15. The printing system of claim 1 wherein:

the microlens array, the microlens aperture array, and the focal point array of claim 1 respectively define a first microlens array, first microlens aperture array, and first focal point array;

the image source further comprises a second planar array of microlenses having respective apertures defining a second microlens aperture array;

the second microlens aperture array is positioned at the projection system'"'"'s object plane;

the microlens elements of the second microlens array have respective focal points which are conjugate to the projection aperture and which define a second focal point array; and

each image source element comprises a respective microlens of the second microlens array and a light-modulating element positioned at the respective microlens'"'"'s focal point.

16. The imaging system of claim 15, further comprising an illumination system and a reflective surface positioned at the second focal point array, and wherein:

the illumination system illuminates the image source in reflection mode;

the light-modulating elements comprise spots of variable reflectivity on the reflective surface at the focal point locations of the second focal point array; and

the second microlens array and projection system are further configured to focus light from the illumination system onto the reflective spots.

17. The printing system of claim 16 wherein the reflective surface comprises a photomask which operates in reflection mode, and the light-modulating elements'"'"' reflectivities are varied by translating the photomask across the second focal point array so that different portions of the photomask with different optical reflectance characteristics are brought into position at the focal points of the second focal point array as the printing surface is scanned.

18. The printing system of claim 1 wherein the projection system is double-telecentric.

19. The printing system of claim 18, wherein the projection system comprises a first collimating lens element that images the projection aperture to infinity on the object side of the projection system, thereby making the system telecentric on the object side, and a second collimating lens element that images the projection aperture to infinity on the projection system'"'"'s image side, thereby making the system telecentric on the image side.

20. The printing system of claim 18 wherein the projection system comprises:

a collimating mirror having first and second off-axis portions; and

a reflector in the projection aperture;

wherein

the first off-axis portion of the collimating mirror images the projection aperture to infinity on the object side of the projection system, thereby making the system telecentric on the object side;

the first off-axis portion reflects light from the object plane toward the projection aperture;

the reflector in the projection aperture reflects the light from the first off-axis portion back onto the collimating mirror on its second off-axis portion;

the second off-axis portion reflects the light from the projection aperture onto the image plane; and

the second off-axis portion images the projection aperture to infinity on the image side, thereby making the system telecentric on the image side.

21. The printing system of claim 1, further comprising an optical detector and positional feedback control mechanism, wherein:

the microlens array and projection system not only focus light from the image source onto the printing surface, but also collect a reflected beam comprising optical energy reflected from the printing surface and project it onto the optical detector, thereby producing a detector signal which provides information on the positional relationship between microlens array and the printing surface; and

the positional information is used by the feedback control mechanism to accurately control the positional relationship.

22. The printing system of claim 21, further comprising a beam splitter disposed to separate the reflected beam from the projection system'"'"'s light path, wherein the light projected onto the printing surface and the reflected light traverse the same optical path between the beam splitter and the printing surface.

23. The printing system of claim 22 wherein the printing surface is illuminated by two wavelengths or narrow spectral ranges of wavelengths, a first wavelength which exposes the photosensitive material, and a second wavelength which is sensed by the detector to provide positional information.

24. The printing system of claim 23 wherein the projection system is double-telecentric.

25. The printing system of claim 24 wherein the projection system comprises:

a collimating mirror having first and second off-axis portions; and

a reflector in the projection aperture;

wherein

the first off-axis portion of the collimating mirror images the projection aperture to infinity on the object side of the projection system, thereby making the system telecentric on the object side;

the first off-axis portion reflects light at the first wavelength from the object plane toward the projection aperture;

the reflector in the projection aperture reflects the light from the first off-axis portion back onto the collimating mirror on its second off-axis portion;

the second off-axis portion reflects the light from the projection aperture onto the image plane; and

the second off-axis portion images the projection aperture to infinity on the image side, thereby making the system telecentric on the image side.

26. The printing system of claim 25 wherein:

the collimating mirror further comprises a third off-axis portion;

the aperture reflector further comprises a first optical coating which is deposited on a transparent wedge substrate, and which exhibits high reflectivity at the first wavelength, but which is transparent at the second wavelength;

the beam splitter comprises a second optical coating which is deposited on the wedge, on the surface opposite that of the first coating;

the second coating is partially reflective at the second wavelength;

illumination energy at the second wavelength is projected from a light source through both coatings, toward the second off-axis portion of the collimating mirror, so that both wavelengths traverse the same optical path between the wedge and the printing surface;

the beam reflected back from the printing surface at the second wavelength is partially reflected by the second coating toward the third off-axis mirror portion, which is spatially separated from the first off-axis portion due to the wedge angle between the two coatings; and

the third off-axis mirror portion then reflects the beam onto the detector.

27. The printing system of claim 21 wherein:

the printing surface further comprises positioning alignment marks that are detected by the positional feedback control mechanism and are used to determine a component of the positional relationship defined by the microlens array'"'"'s and printing surface'"'"'s lateral positional relationship parallel to the microlens array; and

the positional information is used to accurately control the lateral positional relationship and to synchronize the scanning mechanism with the image source.

28. The printing system of claim 27 wherein the alignment marks and focal point array comprise periodic patterns, with the periodicity of the alignment marks differing from that of the focal point array so that the reflected energy from the alignment marks forms a Moire pattern in the detector signal which provides an accurate and precise measure of the lateral positional relationship between the microlens array and the printing surface.

29. The printing system of claim 21 wherein the projection aperture greatly attenuates out-of-focus light from the microlenses so that the detector signal comprises a focus signal that provides an accurate and precise measure of the microlens array'"'"'s focus height relative to the printing surface, and wherein the focus signal is used by the positional feedback control mechanism to accurately control the focus height.

30. The printing system of claim 26 wherein the focus height is detected at one or more positions on the printing surface, and wherein the focus height at each position is detected by comparing the reflected energy signals from two or more microlenses which are focused on proximate points on a flat area on the printing surface, but which have different focal lengths so that the differential detector signal from the microlenses provides a sensitive measure of focus height.

31. The printing system of claim 29 wherein the focus height is detected at one or more positions on the printing surface, and wherein the focus height at each position is detected by comparing the reflected energy signals from two or more microlenses which have the same focal length, but which are focused on proximate points straddling a step or steps on the printing surface so that the differential detector signal from the microlenses provides a sensitive measure of focus height.

32. The printing system of claim 31 wherein:

the focus steps are recessed wells in the printing surface, and the printing surface comprises a top surface outside of the focus wells and a bottom surface at the bottom of the focus wells;

the photosensitive material is disposed on the top surface;

the printing surface is illuminated by two wavelengths or narrow spectral ranges of wavelengths, a first wavelength which exposes the photosensitive material, and a second wavelength which is sensed by the detector to provide the focus signal; and

the focus signal is obtained from microlens elements that are used for the dual purposes of printing and focus sensing, but wherein their focal length at the second wavelength is longer than at the first wavelength due to chromatic dispersion, whereby the microlens array can be positioned to focus the first wavelength onto the top surface while simultaneously focusing the second wavelength onto a focal plane between the top and bottom surfaces to achieve good focus signal resolution.

33. The printing system of claim 1, further comprising a two-axis positioning transducer that continuously adjusts the projection aperture'"'"'s lateral position parallel to the projection aperture plane to correct for small errors in the microlens array'"'"'s and printing surface'"'"'s lateral positional relationship parallel to the microlens array.

34. The printing system of claim 1, further comprising micropositioning transducers disposed around the microlens array'"'"'s periphery outside of its clear aperture, wherein the transducers apply a controlled force distribution to the array to correct focus and tilt errors and compensate for warp or shape mismatch between the printing surface and microlens array.

35. The printing system of claim 34, further comprising micropositioning transducers which control the microlens array'"'"'s lateral translational and rotational positions parallel to the microlens array.