Exposure method utilizing diffracted light having different orders of diffraction

  • US 6,233,041 B1
  • Filed: 06/29/1998
  • Issued: 05/15/2001
  • Est. Priority Date: 08/21/1990
  • Status: Expired due to Fees
First Claim
Patent Images

1. A method of exposing a substrate with a pattern of a mask through a projection optical system, comprising:

  • illuminating the pattern with at least a first light beam and a second light beam from different directions so that a 0-order diffracted beam produced from the pattern by the irradiation of said first light beam passes through a same optical path of said projection optical system as a non-0-order diffracted beam produced from the pattern by the irradiation of said second light beam; and

    projecting the 0-order and non-0-order diffracted beams onto the substrate to form an image of the pattern.

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