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Multi-beam exposure apparatus having mirror tilt angle control, image forming apparatus that employs the exposure apparatus, and image forming method

  • US 6,323,889 B1
  • Filed: 11/12/1999
  • Issued: 11/27/2001
  • Est. Priority Date: 11/13/1998
  • Status: Expired due to Fees
First Claim
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1. An exposure apparatus comprising:

  • a plurality of light sources for emitting light beams, respectively;

    light path alignment mirrors for synthesizing the light beams from the light sources together, such that the light beams are spaced apart from one another by predetermined distances in a first direction;

    a deflection device for deflecting the light beams, emitted from the light sources and synthesized by the light path alignment mirrors, in a second direction perpendicular to the first direction;

    a drift detection sensor for sensing at least one of the light beams emitted from the light sources and deflected by the deflection device, and for detecting how a given light path alignment mirror is drifted in the first direction; and

    light path alignment mirror-driving units for correcting a drift of each of the light path alignment mirrors in accordance with a drift detected by the drift detection sensor.

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