Target and process for its production, and method for forming a film having a high refractive index

  • US 6,334,938 B2
  • Filed: 12/05/2000
  • Issued: 01/01/2002
  • Est. Priority Date: 08/23/1995
  • Status: Expired due to Term
First Claim
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1. A method for forming a film, the method comprising sputtering a target, whereinthe sputtering target comprises a substrate and a target material formed on the substrate;

  • the target material comprises as the main component an oxygen deficient oxide;

    the oxygen deficient oxide comprises a metal oxide of a chemical formula TiOx that is deficient in oxygen as compared with a stoichiometric composition of the metal oxide; and




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