Optical system, especially a projection light facility for microlithography

• US 6,388,823 B1
• Filed: 07/22/2000
• Issued: 05/14/2002
• Est. Priority Date: 06/20/1998
• Status: Expired due to Term

• Current Assignee: CARL Zeiss SMT GmbH (Carl-Zeiss-Stiftung)
• Original Assignee: Carl-Zeiss-Stiftung
• Inventors: Scheiberlich, Arie Cornelis, Gerhard, Michael, Holderer, Hubert, Becker, Jochen, Wagner, Christian, Merz, Erich, Gaber, Erwin
• Primary Examiner(s): MACK, RICKY LEVERN
• Application Number:
  US09/486,017
• Time in Patent Office: 661 Days
• Field of Search: 359/819, 359/820, 359/822, 359/811
• US Class Current: 359/819
• CPC Class Codes: G02B 27/0068 having means for controlling the degree of correction, e.g. using phase modulators, movable elements controlling the phase of light using moving or deformable elements G02B26/06
• CPC Class Codes: G02B 7/023 permitting adjustment
• CPC Class Codes: G02B 7/028 with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation
• CPC Class Codes: G03F 7/70241 Optical aspects of refractive lens systems, i.e. comprising only refractive elements
• CPC Class Codes: G03F 7/70358 Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
• CPC Class Codes: G03F 7/70783 Handling stress or warp of chucks, masks or workpieces, e.g. to compensate for imaging errors or considerations related to warpage of masks or workpieces due to their own weight
• CPC Class Codes: G03F 7/70825 Mounting of individual elements, e.g. mounts, holders or supports workpiece or mask holders G03F7/707

Abstract

An optical system, in particular a projection exposure device for microlithography, with a slit-shaped image field or illumination which is not rotationally symmetrical, has an optical element, in particular, a lens or a mirror which is arranged in a mount (2), and actuators (3) which engage on the optical element (1) at least approximately perpendicularly to the optical axis. The actuators (3) bring about forces and or moments, which are not rotationally symmetrical and which deviate from the radial, on the optical element (1), for the production of bendings which take place substantially without thickness changes.

Claims

1. An optical system comprising:

an optical element,

a deformable mount in which said optical element is arranged, and,

a plurality of actuators that engage a portion of at least one of said deformable mount and said optical element,

wherein said plurality of actuators bring about at least one of forces and moments, which are not rotationally symmetrical and deviate from a radial direction, onto said optical element for generating bendings that result substantially without thickness changes, and

wherein said plurality of actuators engage on said deformable mount in a manner such that said deformable mount produces at least one of thrust forces and bending moments on said optical element.

2. The optical system according to claim 1, wherein said plurality of actuators comprise at least two actuators that are mutually oppositely situated.

3. The optical system according to claim 1, wherein said plurality of actuators comprise hydraulically mechanically or electrically actuating adjusting members.

4. The optical system according to claim 1, wherein said plurality of actuators comprise transmissions.

5. The optical system according to claim 4, wherein said transmissions have solid state joints.

6. The optical system according to claim 1, comprising a projection exposure device for microlithography wherein said optical element comprises one of a lens or a mirror arranged on said deformable mount.

7. The optical system according to claim 1, having a slot-shaped image field.

8. An optical system comprising:

an optical element,

a deformable mount in which said optical element is arranged, and,

a plurality of actuators that engage a portion of at least one of said deformable mount and said optical element,

wherein said plurality of actuators bring about at least one of forces and moments, which are not rotationally symmetrical and deviate from a radial direction, onto said optical element for generating bendings that result substantially without thickness changes, and

wherein said plurality of actuators comprise two mutually opposite first actuators that produce at least one of first thrust forces and first moments running parallel to the optical axis of said optical element, and two second actuators, respectively displaced at 90°

to said first actuators, which produce at least one of second thrust forces and second moments directed opposed to said first thrust forces and first moments.

9. An optical system comprising:

an optical element,

a mount in which said optical element is arranged, and,

a plurality of actuators that engage a portion of at least one of said mount and said optical element,

wherein said plurality of actuators bring about at least one of forces and moments, which are not rotationally symmetrical and deviate from a radial direction, onto said optical element for generating bendings that result substantially without thickness changes,

wherein said plurality of actuators comprise a plurality of piezoelectric elements that engage said optical element at least one of directly or via an intermediate member, and

wherein said plurality of piezoelectric elements are distributed on the periphery of said mount such that said plurality of piezoelectric elements produce at least one of thrust forces and moments that are directed at least approximately parallel to the optical axis of said optical element.

10. The optical system according to claim 9, further comprising a lens seating arranged between said plurality of piezoelectric elements and said optical element.

11. An optical system comprising:

an optical element,

a mount in which said optical element is arranged, and,

a plurality of actuators that engage a portion of at least one of said mount and said optical element,

wherein said plurality of actuators bring about at least one of forces and moments, that are not rotationally symmetrical and deviate from a radial direction, onto said optical element for generating bendings that result substantially without thickness changes,

wherein said plurality of actuators comprise a plurality of piezoelectric elements that engage said optical element at least one of directly or via an intermediate member,

further comprising a lens seating arranged between said plurality of piezoelectric elements and said optical element, and

wherein said lens seating comprises at least approximately a wedge shape.

12. An optical system comprising:

an optical element,

a mount in which said optical element is arranged, and,

a plurality of actuators that engage a portion of at least one of said mount and said optical element,

wherein said plurality of actuators bring about at least one of forces and moments, which are not rotationally symmetrical and that deviate from a radial direction, onto said optical element for generating bendings that result substantially without thickness changes, and

wherein said plurality of actuators comprise pneumatic bellows that engage said optical element by one of directly or via intermediate members.

13. An optical system comprising:

an optical element,

a deformable mount in which said optical element is arranged, and

a plurality of actuators that engage a portion of at least one of said deformable mount and said optical element,

wherein said plurality of actuators bring about at least one of forces and moments, which are not rotationally symmetrical and deviate from a radial direction, onto said optical element for generating bendings that result substantially without thickness changes,

further comprising a lens seating having at least approximately a wedge shape, arranged between said plurality of actuators and said optical element.