Manufacturing method for integrated sensor arrays
First Claim
1. A method for fabricating integrated sensor arrays on a common substrate, comprising a first step of developing a resist mask on the surface of the substrate, wherein the resist mask is provided with openings for all areas of the substrate where a deposition is to take place in subsequent steps;
- a second step in which a first shadow mask is located over the resist mask from the first step and a first deposition of materials takes place in which the first shadow mask screens and protects all openings in the resist mask that are not to be subjected to deposition leaving only those where the deposition is to take place;
a third step in which a second shadow mask is located over the resist mask and a second deposition takes place in areas of the openings in the resist mask on the substrate that are not screened by said second deposition;
subsequent steps in which additional shadow masks are used to expose the desired openings in the resist mask to a treatment; and
a last step in which after all depositions have been carried out at different openings in the resist mask the last shadow mask is removed and then the resist mask is removed.
2 Assignments
0 Petitions
Accused Products
Abstract
Method for the fabrication of sensor arrays with individually different sensing surface, where lift off technique and shadow mask technique is used simultaneously. A resist layer with openings at all locations where coatings are intended is applied with lift off technique. Then a shadow mask is used provided with widows only at the openings where deposit is intended for one specific coating. By for instance vapor deposition, coatings are effected where there are openings in the resist and windows in the shadow mask. The shadow mask is moved to the next depositions location and the procedure repeated until all coatings have been effected. The shadow mask is removed as is also the resist giving an improved sensor quality compared to prior-art methods.
26 Citations
11 Claims
-
1. A method for fabricating integrated sensor arrays on a common substrate, comprising a first step of developing a resist mask on the surface of the substrate, wherein the resist mask is provided with openings for all areas of the substrate where a deposition is to take place in subsequent steps;
- a second step in which a first shadow mask is located over the resist mask from the first step and a first deposition of materials takes place in which the first shadow mask screens and protects all openings in the resist mask that are not to be subjected to deposition leaving only those where the deposition is to take place;
a third step in which a second shadow mask is located over the resist mask and a second deposition takes place in areas of the openings in the resist mask on the substrate that are not screened by said second deposition;
subsequent steps in which additional shadow masks are used to expose the desired openings in the resist mask to a treatment; and
a last step in which after all depositions have been carried out at different openings in the resist mask the last shadow mask is removed and then the resist mask is removed. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
- a second step in which a first shadow mask is located over the resist mask from the first step and a first deposition of materials takes place in which the first shadow mask screens and protects all openings in the resist mask that are not to be subjected to deposition leaving only those where the deposition is to take place;
Specification
-
- Resources
-
Current AssigneeAppliedSensor Sweden AB (Ams-Osram AG)
-
Original AssigneeAppliedSensor Sweden AB (Ams-Osram AG)
-
InventorsFägerman, Per-Erik
-
Primary Examiner(s)Smith, Matthew
-
Assistant Examiner(s)Lee, Calvin
-
Application NumberUS09/491,020Time in Patent Office882 DaysField of Search438/695, 438/697, 438/680, 438/10, 438/11, 438/12, 438/17, 438/37, 438/49, 438/50, 430/311, 430/312US Class Current438/695CPC Class CodesG01N 27/414 Ion-sensitive or chemical f...G03F 7/0007 Filters, e.g. additive colo...
