Multi-layered mirror

• US 6,441,963 B2
• Filed: 05/30/2001
• Issued: 08/27/2002
• Est. Priority Date: 09/08/1998
• Status: Expired due to Term

• Current Assignee: Nikon Corporation
• Original Assignee: Nikon Corporation
• Inventors: Shiraishi, Masayuki, Murakami, Katsuhiko
• Primary Examiner(s): CHANG, AUDREY Y
• Application Number:
  US09/867,191
• Publication Number:
  US 20010033421A1
• Time in Patent Office: 454 Days
• Field of Search: 359/580, 359/584, 359/585, 359/586, 359/589, 359/590, 359/359, 359/360, 378/84, 378/85, 372/5
• US Class Current: 359/584
• CPC Class Codes: B82Y 10/00 Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
• CPC Class Codes: G03F 7/70058 Mask illumination systems
• CPC Class Codes: G03F 7/70233 Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
• CPC Class Codes: G21K 1/062 Devices having a multilayer structure

Abstract

A multi-layered mirror has a substrate, a first layer of a first substance, a second layer of a second substance. The refractive index of the first substance in a utilized wavelength region is different from that of the second substance. The first and second layers are laminated alternately on the substrate. To obtain a high reflectivity and superior optical characteristics, a multi-layered structure is formed within either the first layer or the second layer using at least two substances whose real parts of the complex indices of refraction in the utilized wavelength region are approximately the same. Alternatively, a layer surface is smoothed before forming a next layer thereon. An exposure apparatus that uses multi-layered mirrors of the present invention uses light with higher efficiency.

Claims

1. A multi-layered mirror comprising:

a substrate;

at least one first layer of a first substance with a small refractive index; and

at least one second layer of a second substance with a large refractive index,

wherein the at least one first layer and the at least one second layer are alternately laminated on the substrate by sputtering, and

wherein an interface between the at least one first and the at least one second layers of the multi-layered mirror has been irradiated by an ion beam and smoothed so that for d>

5 nm, σ

_int−

σ

_sub<

0.2 nm, and for d<

5 nm, σ

_int−

σ

_sub<

0.5 nm, where d is a periodic length defined as a sum of the first substance layer thickness and the second substance layer thickness, σ

_sub is an RMS value of surface roughness of the substrate, and σ

_int is an RMS value of roughness of the interface.

2. The multi-layered mirror according to claim 1, wherein a region over which the first substance of the first layer and the second substance of an adjacent second layer diffuse into each other is less than or equal to 1 nm.

3. A multi-layered mirror comprising:

a substrate;

at least one first layer of a first substance with a small refractive index; and

at least one second layer of a second substance with a large refractive index,

wherein the at least one first layer and the at least one second layer are alternately laminated on the substrate by sputtering,

wherein an interface between the first layer and the second layer is smoothed so that a region over which the first substance of the first layer and the second substance of an adjacent second layer diffuse into each other is less than or equal to 1 nm, and

wherein the interface is smoothed so that for d>

5 nm, σ

_int−

σ

_sub<

0.2 nm, and for d<

5 nM, σ

_int−

σ

_sub<

0.5 nm, where d is a periodic length defined as a sum of the first substance layer thickness and the second substance layer thickness, σ

_sub is an RMS value of surface roughness of the substrate, and σ

_int is an RMS value of roughness of the interface.

4. A multi-layered mirror comprising;

a substrate;

a first layer of a first substance formed on the substrate by sputtering;

a second layer of a second substance formed on the first layer by sputtering;

a third layer of the first substance formed on the second layer by sputtering; and

a fourth layer of the second substance formed on the third layer by sputtering,

wherein a refractive index of the first substance is different from that of the second substance, and

wherein at least one interface between two adjacent layers has been irradiated by an ion beam and smoothed so that for d>

5 nM, σ

_int−

σ

_sub<

0.2 nm, and for d<

5 nm, σ

_int−

σ

_sub<

0.5 nm, where d is a periodic length defined as a sum of the first substance layer thickness and the second substance layer thickness, σ

_sub is an RMS value of surface roughness of the substrate, and σ

_int is an RMS value of roughness of the interface.

5. The multi-layered mirror according to claim 4, wherein the first substance is molybdenum and the second substance is silicon.

6. The multi-layered mirror according to claim 4, wherein the first substance is silicon and the second substance is molybdenum.

7. The multi-layered mirror according to claim 4, wherein a region over which the first substance of the first layer and the second substance of an adjacent second layer diffuse into each other is less than or equal to 1 nm.

8. A method for manufacturing a multi-layered mirror upon a substrate comprising:

alternatively laminating by sputtering upon the substrate a first layer of a first substance with a small refractive index and a second layer of a second substance with a large refractive index; and

smoothing at least one of the first or the second layer by irradiation using an ion beam prior to forming another layer on top of that layer,

wherein the at least one of the first or the second layer is smoothed so that for d>

5 nm, σ

_int−

σ

sub<

0.2 nm, and for d<

5 nm, σ

_int−

σ

_sub<

0.5 nm, where d is a periodic length defined as a sum of the first substance layer thickness and the second substance layer thickness, σ

_sub is an RMS value of surface roughness of the substrate, and σ

_int is an RMS value of roughness of an interface between adjacent ones of at least one of the first and at least one of the second layers.

9. The method according to claim 8, wherein an ion type of the ion beam used in the smoothing step is an inert gas.

10. The method claim according to claim 9, wherein the substrate is either electrically grounded or a DC bias voltage is imparted to the substrate.

11. The method claim according to claim 9, wherein the energy of the ion beam used in the smoothing step is greater than 50 eV and less than 1000 eV.

12. The method claim according to claim 11, wherein the substrate is either electrically grounded or a DC bias voltage is imparted to the substrate.

13. The method according to claim 8, wherein energy of the ion beam used in the smoothing step is greater than 50 eV and less than 1000 eV.

14. The method claim according to claim 8, wherein the substrate is either electrically grounded or a DC bias voltage is imparted to the substrate.

15. The method claim according to claim 13, wherein the substrate is either electrically grounded or a DC bias voltage is imparted to the substrate.