Gas driven rotating susceptor for rapid thermal processing (RTP) system

• US 6,449,428 B2
• Filed: 12/11/1998
• Issued: 09/10/2002
• Est. Priority Date: 12/11/1998
• Status: Expired due to Term

• Current Assignee: Mattson Technology, Inc. (Beijing Economic & Technology Development Area), BeiJing E-Town Semiconductor Technology Co., Ltd.
• Original Assignee: Mattson Technology, Inc. (Beijing Economic & Technology Development Area)
• Inventors: Hauke, Andreas, Weber, Karsten, Zernickel, Dieter, Aschner, Helmut
• Primary Examiner(s): Walberg, Teresa
• Application Number:
  US09/209,735
• Publication Number:
  US 20010002948A1
• Time in Patent Office: 1,369 Days
• Field of Search: 392/418, 392/416, 219/390, 219/405, 219/411, 118/724-725, 118/50.1, 118/730, 118/500, 118/728
• US Class Current: 392/418
• CPC Class Codes: C30B 25/12 Substrate holders or susceptors
• CPC Class Codes: C30B 31/14 Substrate holders or susceptors
• CPC Class Codes: H01L 21/67115 mainly by radiation

Abstract

Air bearings support a rotating wafer carrying base in an RTP system. The base in proximity to the air bearing is protected from warping due to absorption of radiation from the hot wafer being treated. The most preferred embodiment splits the base into an inner disk carrying the wafer and an outer ring, where the inner ring which absorbs the most energy contacts and is supported at three points by the outer disk which is supported by the air bearing.

Claims

1. An apparatus, comprising;

a rotatable base, the base for supporting an object being processed in a Rapid Thermal Processing (RTP) System equipped with air bearings for supporting the rotating base, the base comprising;

an outer part, forming bearing surfaces for bearing on the air bearings; and

an inner part, the inner part supported by the outer part, the inner part mechanically decoupled from the outer part to prevent warping of the base due to non-uniform heating of the base by radiation from the object being processed, so that the bearing surfaces of the outer part remain very parallel to the surfaces of the air bearings during rapid thermal processing of the object.

2. The apparatus of claim 1, wherein the base is rotated by impinging a flowing fluid on the base.

3. The apparatus of claim 1, wherein the inner part is mechanically decoupled from the outer part by a slot cut in the base.

4. The apparatus of claim 1, wherein inner part comprises a plate separate from outer part, the plate supported by the outer part at a plurality of points, the plate supporting the object.

5. The apparatus of claim 4, wherein the plate is engaged with the outer part so that orientation of the plate with respect the base outer part is constant as the base outer part rotates.

6. The apparatus of claim 1, wherein inner part comprises a plate joined to the outer part at a plurality of points by joining means which allow relative expansion between the base and the plate.

7. The apparatus of claim 1, wherein the angular position of the base is determined by optical means.

8. The apparatus of claim 1, wherein the angular position of the base is determined by magnetic means.

9. A method of rapid thermal processing (RTP) of an object, comprising:

supporting the object on a rotatable base, the rotatable base supported by air bearings;

processing the object with radiation from radiation sources of an RTP system while rotating the object on the rotatable base,

wherein the rotatable base comprises an outer part forming bearing surfaces for bearing on the air bearings, and an inner part;

wherein the bearing surfaces of the outer part are kept very parallel to the surfaces of the air bearings by a first means which mechanically decouples the inner part from the outer part to prevent warping of the base due to non-uniform heating of the base by radiation from the object being processed.

10. The method of claim 9, wherein the base is rotated by impinging a flowing fluid on the base.

11. A system comprising;

a rapid thermal processing system;

air bearings for supporting a rotatable base in the processing chamber of the RTP system,

a rotatable base, the base for supporting an object being processed in the Rapid Thermal Processing (RTP) System, the base comprising;

an outer part, forming bearing surfaces for bearing on the air bearings; and

an inner part, the inner part supported by the outer part, the inner part mechanically decoupled from the outer part to prevent warping of the base due to non-uniform heating of the base by radiation from the object being processed, so that the bearing surfaces of the outer part remain very parallel to the surfaces of the air bearings during rapid thermal processing of the object.