Apparatus and method for growth of a thin film

  • US 6,511,539 B1
  • Filed: 09/08/1999
  • Issued: 01/28/2003
  • Est. Priority Date: 09/08/1999
  • Status: Expired due to Term
First Claim
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1. A method for depositing a layer on a substrate comprising the steps of:

  • (a) providing a reaction chamber for receiving said substrate;

    (b) evacuating said reaction chamber through a vacuum pump;

    (c) providing a continuous flow of carrier gas to said reaction chamber;

    (d) providing alternating and sequential concentration pulses of at least two reactants to the carrier gas flow, at least one of the reactants containing excited species.

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