Micromachined apparatus for improved reflection of light

• US 6,578,974 B2
• Filed: 09/07/2001
• Issued: 06/17/2003
• Est. Priority Date: 05/18/2000
• Status: Expired due to Term

• Current Assignee: Calient Networks Incorporated
• Original Assignee: Calient Networks Incorporated
• Inventors: Helkey, Roger Jonathan
• Primary Examiner(s): Sikder, Mohammad
• Application Number:
  US09/948,801
• Publication Number:
  US 20020018311A1
• Time in Patent Office: 648 Days
• Field of Search: 359/879, 359/881, 359/871, 359/872, 359/873, 359/874, 359/877, 359/224, 359/225, 359/226, 359/298, 359/848, 359/849
• US Class Current: 359/879
• CPC Class Codes: G02B 26/0841 the reflecting element being moved or deformed by electrostatic means
• CPC Class Codes: Y10S 359/904 Micromirror

Abstract

A micromachined apparatus for reflecting light is described that is designed to reduce losses in quality or intensity of light. Mirrors are used having lengths that are longer than their widths to reduce clipping of light when a mirror is located at an angle with respect to light falling thereon. Relatively long mirror torsion components are used to reduce forces required to pivot the mirrors. Regardless of the dimensions of the mirrors and the use of long torsion components, the mirrors are still located relatively close to one another. The relatively close positioning of the mirrors is due to a combined use of notches formed in support frames to which the torsion components are secured, oval shapes of the mirrors which take up less space than rectangular shapes, matching oval openings in the support frames, and the arrangement of the support frames in a non-rectangular array wherein tips of the support frames are located between one another.

Claims

1. A micromachined apparatus for reflecting light, comprising:

a support structure;

a plurality of support frames pivotally secured to the support structure and being located in first and second substantially parallel lines, the support frames in the first line pivoting about a first support frame axis and the support frames in the second line pivoting about a second support frame axis which is spaced and substantially parallel to the first support frame axis, a respective support frame in the second line being partially located between adjacent ones of the two of the support frames in the first line; and

a plurality of mirrors, each being secured to a respective support frame so as to be pivotal about a respective mirror axis transverse to a respective support frame axis about which the support frame pivots.

2. An apparatus according to claim 1, further comprising an electrostatic barrier structure located between the support frames and being formed so as to completely surround each support frame.