Self aligning non contact shadow ring process kit

  • US 6,589,352 B1
  • Filed: 12/10/1999
  • Issued: 07/08/2003
  • Est. Priority Date: 12/10/1999
  • Status: Expired due to Term
First Claim
Patent Images

1. An apparatus for processing substrates, comprising:

  • a chamber;

    a substrate support disposed in the chamber;

    a first edge ring disposed on the substrate support, wherein the first edge ring comprises one or more tapered recesses and one or more slots; and

    a second edge ring having two or more matching tapered pins disposed thereon for mating engagement with the recesses and slots of the first edge ring.

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