Particle beam processing apparatus

  • US 6,610,376 B1
  • Filed: 11/30/2000
  • Issued: 08/26/2003
  • Est. Priority Date: 11/05/1999
  • Status: Expired due to Term
First Claim
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1. A method for causing a chemical reaction on a substrate in a particle beam processing device, comprising:

  • creating a vacuum for a particle generating assembly having at least one filament;

    heating the at least one filament to create a plurality of particles;

    operating the particle generating assembly at a first voltage having a range of 110 kVolts or less;

    operating a foil support assembly having a thin foil at a second voltage, which is higher than the first voltage, to cause at least a portion of said particles to travel from the particle generating assembly to the foil support assembly and to exit the vacuum for the particle generating assembly, the thin foil being made of titanium or alloys thereof and having a thickness of 10 micrometers or less; and

    passing the exiting particles through the thin foil to a processing assembly where they cause a chemical reaction on the substrate.

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