Silylation layer for optical devices

• US 6,642,963 B1
• Filed: 06/29/1998
• Issued: 11/04/2003
• Est. Priority Date: 06/29/1998
• Status: Expired due to Fees

• Current Assignee: Intel Corporation
• Original Assignee: Intel Corporation
• Inventors: Assadi, Azar
• Primary Examiner(s): MOE, AUNG SOE
• Application Number:
  US09/106,539
• Time in Patent Office: 1,954 Days
• Field of Search: 348/294, 348/308, 348/273, 348/272, 348/342, 348/335, 430/7, 430/169, 257/215, 257/440, 438/57, 438/60, 438/70, 250/208.1
• US Class Current: 348/273
• CPC Class Codes: G02B 1/10 Optical coatings produced by application to, or surface treatment of, optical elements G02B1/08 takes precedence
• CPC Class Codes: H01L 27/14618 Containers
• CPC Class Codes: H01L 27/14621 Colour filter arrangements
• CPC Class Codes: H01L 27/14632 Wafer-level processed structures
• CPC Class Codes: H01L 27/14687 Wafer level processing
• CPC Class Codes: H01L 2924/00 Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
• CPC Class Codes: H01L 2924/0002 Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
• CPC Class Codes: H04N 25/134 based on three different wavelength filter elements

Abstract

An optical device that includes a filter material overlying an area over a photosensitive portion of the device. The optical device also includes a silylation layer overlying the filter material.

Claims

1. An optical device comprising:

a monolayer of a first color filter material overlying an area over a first photosensitive region and adapted to select light corresponding to a determined wavelength to be absorbed by the first photosensitive region;

a monolayer of a second color filter material overlying an area over a second different photosensitive region and adapted to select light corresponding to a determined wavelength to be absorbed by the second photosensitive region; and

a silylation layer overlying and in physical contact with each of the first color filter material and the second color filter material as the exposed surface of the optical device wherein the silylation layer is comprised of a material selected from at least one of zirconium (IV)-n-propoxide, titanium (IV)-propoxide, titanium-isoproxide, tetraethyorthosilicate, tetramethylorthosilicate, 4-hydroxycyclohexylphenylbenzene, and 1-hydroxycyclohexylphenylketone.

2. An optical device comprising:

a layer of color filter material overlying an area over a photosensitive portion to select light incident on the device corresponding to a determined wavelength; and

a silylation layer coating a portion of the color filter material as the exposed surface of the optical device, wherein the silylation layer is comprised of material selected from at least one of zirconium (IV)-n-propoxide, titanium (IV)-propoxide, titanium-isoproxide, tetraethylorthosilicate, tetramethylorthosilicate, 4-hydroxycyclohexylphenylbenzene, and 1-hydroxycyclohexylphenylketone.

3. An imaging system comprising:

an imaging sensor of an integrated circuit having a sensor portion with a plurality of photocells providing sensor signals in response to incident light and control signals and a non-sensor portion, a layer of color filter material overlying the sensor portion, the layer of color filter material adapted to select light incident on the sensor corresponding to a determined wavelength and a silylation layer coating a portion of the layer of color filter material in an area over the sensor portion as the exposed surface of the optical device, wherein the silylation layer is comprised of material selected from at least one of zirconium (IV)-n-propoxide, titanium (IV)-propoxide, titanium-isoproxide, tetraethylorthosilicate, tetramethylorthosilicate, 4-hydroxycyclohexylphenylbenzene, and 1-hydroxycyclohexylphenylketone;

control circuitry configured to generate the control signals for controlling the imaging sensor; and

signal processing circuitry for generating image data in response to the sensor signals.

4. An optical device comprising:

a monolayer of a first color filter material overlying an area over a first photosensitive region and adapted to select light corresponding to a determined wavelength to be absorbed by the first photosensitive region;

a monolayer of a second color filter material overlying an area over a second different photosensitive region and adapted to select light corresponding to a determined wavelength to be absorbed by the second photosensitive region; and

a silylation layer overlying and in physical contact with each of the first color filter material and the second color filter material as the exposed surface of the optical device wherein the silylation layer is selected from the group consisting of propoxides and propoxide derivatives.