Resist composition

• US 6,673,511 B1
• Filed: 10/27/2000
• Issued: 01/06/2004
• Est. Priority Date: 10/29/1999
• Status: Expired due to Term

• Current Assignee: Shin-Etsu Chemical Company Limited
• Original Assignee: Shin-Etsu Chemical Company Limited
• Inventors: Watanabe, Takeru, Ohsawa, Youichi, Hatakeyama, Jun
• Primary Examiner(s): ASHTON, ROSEMARY E
• Application Number:
  US09/697,921
• Time in Patent Office: 1,166 Days
• Field of Search: 430/270.1, 430/326, 430/325
• US Class Current: 430/270.1
• CPC Class Codes: G03F 7/0045 with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
• CPC Class Codes: G03F 7/0392 the macromolecular compound being present in a chemically amplified positive photoresist composition
• CPC Class Codes: Y10S 430/106 Binder containing

Abstract

Although use of a nitrogen-containing compound as a basic compound component of a resist composition makes it possible to ease the T-top problem at an acid dissociation constant pKa falling within a range of 2 to 6, it is accompanied with the problem that the reaction, that is, acid diffusion upon use of a highly-reactive acid-labile group cannot be controlled. In order to overcome this problem, one or more basic compounds selected from those represented by the following formulas (I) to (III) and (1) to (4) are employed.

Claims

1. A resist composition comprising:

one or more basic compounds selected from those represented by the following formula (I);

2. A resist composition according to claim 1, further comprising a dissolution inhibitor.

3. A resist composition comprising:

one or more basic compounds selected from those represented by the following formulas (1) to (4);

wherein, R¹ are the same or different and each independently represents a C_1-5 alkylene group, R²s are the same or different and each independently represents a linear, branched or cyclic alkyl group of 1 to 20 carbon atoms containing a carbonyl group or an ester group, R³ represents a hydrogen atom or a linear, branched or cyclic alkyl group of 1 to 20 carbon atoms which may contain a hydroxyl or ether group, and R⁴s are the same or different and each independently represents a linear, branched or cyclic alkyl group of 1 to 20 carbon atoms which may contain a carbonyl, ester or ether group;

an organic solvent;

a base resin which is an alkali insoluble or sparingly-soluble resin having an acidic functional group protected with an acid-labile group but becomes alkali soluble upon elimination of said acid-labile group; and

an acid generator, said resist composition being a positive type resist composition.

4. A resist composition according to claim 3, further comprising a dissolution inhibitor.

5. A resist composition comprising:

one or more basic compounds selected from those represented by the following formula (III);

wherein R⁶⁵s are the same or different and each independently represents a hydrogen atom or a linear, branched or cyclic alkyl group of 1 to 15 carbon atoms which may contain an ether, carbonyl, ester or hydroxyl group;

an organic solvent;

a base resin which is an alkali insoluble or sparingly-soluble resin having an acidic functional group protected with an acid-labile group but becomes alkali soluble upon elimination of said acid-labile group; and

an acid generator, said resist composition being a positive type resist composition.

6. A resist composition according to claim 5, further comprising a dissolution inhibitor.

7. A resist composition comprising:

one or more basic compounds selected from those represented by the following formula (I);

8. A resist composition comprising:

one or more basic compounds selected from those represented by the following formulas (1) to (4);

wherein, R¹s are the same or different and each independently represents a C_1-5 alkylene group, R²s are the same or different and each independently represents a linear, branched or cyclic alkyl group of 1 to 20 carbon atoms containing a carbonyl group or an ester group, R³ represents a hydrogen atom or a linear, branched or cyclic alkyl group of 1 to 20 carbon atoms which may contain a hydroxyl or ether group, and R⁴s are the same or different and each independently represents a linear, branched or cyclic alkyl group of 1 to 20 carbon atoms which may contain a carbonyl, ester or ether group;

an organic solvent;

a base resin which is an alkali soluble resin but becomes sparingly soluble in alkali by crosslinking with a crosslinker;

an acid generator; and

said crosslinker which crosslinks in the presence of an acid, said resist composition being a negative type resist composition.

9. A resist composition comprising:

one or more basic compounds selected from those represented by the following formula (III);

wherein R⁶⁵s are the same or different and each independently represents a hydrogen atom or a linear, branched or cyclic alkyl group of 1 to 15 carbon atoms which may contain an ether, carbonyl, ester or hydroxyl group;

an organic solvent;

a base resin which is an alkali soluble resin but becomes sparingly soluble in alkali by crosslinking with a crosslinker;

an acid generator; and

said crosslinker which crosslinks in the presence of an acid, said resist composition being a negative type resist composition.