Infrared projector

• US 6,703,631 B2
• Filed: 10/05/2001
• Issued: 03/09/2004
• Est. Priority Date: 02/07/2000
• Status: Expired due to Fees

• Current Assignee: Mitsubishi Denki Kabushiki Kaisha (Mitsubishi Electric Corporation)
• Original Assignee: Mitsubishi Denki Kabushiki Kaisha (Mitsubishi Electric Corporation)
• Inventors: Suzuki, Hiroshi
• Primary Examiner(s): Lee, John R.
• Assistant Examiner(s): Kalivoda, Christopher M.
• Application Number:
  US09/958,229
• Publication Number:
  US 20020158210A1
• Time in Patent Office: 886 Days
• Field of Search: 250/316.1, 250/493.1, 250/495.1, 250/504.R, 250/208.1, 250/216, 250/291, 359/355-356
• US Class Current: 250/504.00R
• CPC Class Codes: G02B 26/0841 the reflecting element being moved or deformed by electrostatic means

Abstract

To provide an infrared projector in which it is not necessary to develop arrayed elements radiating infrared radiation, a high temporal resolution and a high spatial resolution are made available, the simulation of a high-temperature body is made possible, the wavelength and luminance characteristics are controlled, a high contrast and a high simulation accuracy are made available, and so on. A micromirror device (6) as an optical modulator for changing the direction of reflection by providing a plurality of mirrors and changing the direction of each of the plurality of mirrors independently, a controller (7) for controlling the direction of each mirror of the micromirror device, and infrared light sources (8, 9, and 10) for irradiating the micromirror device with infrared light are provided.

Claims

1. An infrared projector for projecting a two-dimensional infrared radiation distribution pattern, the infrared projector comprising:

a micromirror device as an optical modulator for changing the direction of reflection by providing a plurality of mirrors and changing the direction of each of the plurality of mirrors independently;

a controller for controlling the direction of each mirror of the micromirror device;

an infrared light source for irradiating the micromirror device with infrared light; and

an infrared wavelength selection means for adjustably selecting the wavelength of infrared radiation incident on the micromirror device;

the controller also controlling the infrared wavelength selection means such that the infrared radiation incident on the micromirror device has a desired wavelength characteristic.

2. An infrared projector as claimed in claim 1, wherein a high-temperature black-body furnace is provided as the infrared light source.

3. An infrared projector as claimed in claim 1, said infrared wavelength selection means including two or more bandpasS filters having different passbands.

4. An infrared projector as claimed in claim 2, said infrared wavelength selection means including two or more bandpass filters having different passbands.

5. An infrared projector as claimed in claim 1, said infrared wavelength selection means including a diffraction grating.

6. An infrared projector as claimed in claim 2, said infrared wavelength selection means including a diffraction grating.

7. An infrared projector as claimed in claim 5, said infrared wavelength selection means including moveable supporting means for tilting the diffraction grating with respect to the incident direction of infrared radiation.

8. An infrared projector as claimed in claim 6, said infrared wavelength selection means including moveable supporting means for tilting the diffraction grating with respect to the incident direction of infrared radiation.

9. An infrared projector as claimed in claim 1, said infrared wavelength selection means including two or more diffraction gratings having different grating pitches.

10. An infrared projector as claimed in claim 2, said infrared wavelength selection means including two or more diffraction gratings having different grating pitches.

11. An infrared projector as claimed in claim 7, said infrared wavelength selection means including two or more diffraction gratings having different grating pitches.

12. An infrared projector as claimed in claim 8, said infrared wavelength selection means including two or more diffraction gratings having different grating pitches.

13. An infrared projector as claimed in claim 1, said infrared wavelength selection means including a prism.

14. An infrared projector as claimed in claim 2, said infrared wavelength selection means including a prism.

15. An infrared projector as claimed in claim 13, said infrared wavelength selection means including a moveable supporting means for tilting the prism with respect to the incident direction of infrared radiation.

16. An infrared projector as claimed in claim 14, said infrared wavelength selection means including a moveable supporting means for tilting the prism with respect to the incident direction of infrared radiation.

17. An infrared projector as claimed in claim 1, the controller controlling the infrared wavelength selection means according to a spectral luminance distribution received by the controller.

18. An infrared projector as claimed in claim 1, said controller controlling the micromirror device based on the desired two-dimensional infrared radiation pattern and the infrared luminance in a passband of the infrared wavelength selection means.

19. An infrared projector as claimed in claim 1, said infrared light source including an integrating sphere for improving illumination uniformity of the infrared light.

20. An infrared image projecting device for projecting a two-dimensional infrared image, the infrared projector comprising:

an infrared light source, said infrared light source generating infrared light;

a micromirror device optically coupled to said infrared light source, said micromirror device including a plurality of mirrors capable of changing the direction of reflection for the infrared light incident thereon;

an infrared wavelength selecting device optically coupled to said infrared light source and said micromirror device; and

a wavelength and luminance controller operatively connected to said infrared wavelength selecting device and said micromirror device,

said wavelength and luminance controller controlling said infrared wavelength selecting device such that the infrared light has a desired wavelength characteristic,

said wavelength and luminance controller controlling said micromirror device such that the two-dimensional infrared image projected from said micromirror device has a desired luminance pattern.

21. The infrared image projecting device as claimed in claim 20, said wavelength and luminance controller controlling said infrared wavelength selecting device according to a spectral luminance distribution received by said wavelength and luminance controller.

22. The infrared image projecting device as claimed in claim 20, said wavelength and luminance controller controlling said micromirror device based on a two-dimensional infrared radiation pattern and the infrared luminance in a passband of said infrared wavelength selecting device.