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Chemical-mechanical planarization slurries and powders and methods for using same

  • US 6,730,245 B2
  • Filed: 01/02/2001
  • Issued: 05/04/2004
  • Est. Priority Date: 02/24/1997
  • Status: Expired due to Fees
First Claim
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1. A method for the production of abrasive particles adapted for use in a CMP slurry, comprising the steps of:

  • a) generating an aerosol of droplets from a liquid wherein said liquid comprises an abrasive compound precursor and wherein said droplets have a size distribution such that at least about 80 weight percent of said droplets have a size of not greater than about 5 μ

    m;

    b) moving said droplets in a carrier gas; and

    c) heating said droplets to remove liquid therefrom and form abrasive particles of said abrasive compound.

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