Multilayer article and method of making by arc plasma deposition

• US 6,737,121 B2
• Filed: 01/16/2002
• Issued: 05/18/2004
• Est. Priority Date: 03/17/1999
• Status: Expired due to Term

• Current Assignee: Sabic Innovative Plastics IP BV (Government of Saudi Arabia)
• Original Assignee: General Electric Company
• Inventors: Iacovangelo, Charles Dominic, Yang, Barry Lee-Mean
• Primary Examiner(s): PADGETT, MARIANNE L
• Application Number:
  US10/046,607
• Publication Number:
  US 20020110695A1
• Time in Patent Office: 853 Days
• Field of Search: 427/452, 427/453, 427/455, 427/525, 427/527, 427/529, 427/530, 427/531, 427/564, 427/563, 427/566, 427/567, 427/576, 427/580, 427/579, 427/489, 204/192.38
• US Class Current: 427/452
• CPC Class Codes: C03C 17/3417 all coatings being oxide coatings
• CPC Class Codes: C03C 17/3435 comprising a nitride, oxynitride, boronitride or carbonitride
• CPC Class Codes: C03C 17/3441 comprising carbon, a carbide or oxycarbide
• CPC Class Codes: C03C 17/347 comprising a sulfide or oxysulfide
• CPC Class Codes: C03C 17/42 at least one coating of an organic material and at least one non-metal coating
• CPC Class Codes: C23C 14/22 characterised by the process of coating
• CPC Class Codes: C23C 14/32 by explosion; by evaporation and subsequent ionisation of the vapours , e.g. ion-platingC23C14/34 - C23C14/48 take precedence
• CPC Class Codes: C23C 16/513 using plasma jets
• CPC Class Codes: Y10T 428/24942 including components having same physical characteristic in differing degree
• CPC Class Codes: Y10T 428/31663 As siloxane, silicone or silane

Abstract

According to an exemplary embodiment of the invention, a method of forming a plurality of layers on an article comprises steps of generating a plasma by forming an arc between a cathode and an anode; injecting a first material comprising an organic compound into the plasma to deposit a first layer on the article; injecting a second material comprising an organometallic material into the plasma to form a second layer on the first layer; and injecting a third material comprising a silicon containing organic compound into the plasma to deposit a third layer on the second layer. The invention also relates to an article of manufacture comprising a substrate; an interlayer disposed on the substrate; a second layer disposed on the interlayer, the second layer comprising an inorganic ultraviolet absorbing material; and a third layer disposed on the second layer, the third layer comprising an abrasion resistant material. The interlayer may comprise a polymerized organosilicon material or a polymerized hydrocarbon material, for example. The second layer may comprise a metal oxide or zinc sulfide, for example. The third layer may comprise an oxidized organosilicon material, for example.

Claims

1. A method of depositing a plurality of layers on a substrate, the method comprising steps of:

flowing a plasma gas in a plasma generation chamber in communication with a deposition chamber, the deposition chamber having a lower pressure than the plasma generation chamber, the article being disposed in the deposition chamber;

generating an arc in the plasma generation chamber to create a plasma, which flows into the deposition chamber;

injecting a first material comprising and a first oxidant at least one of a polymerizable hydrocarbon and an organosilicon material into the plasma and reacting the first material to form an interlayer on the substrate, the interlayer comprising a polymerized organosilicon material; and

injecting a second material comprising and a second oxidant at least one of an elemental metal and an organometallic compound into the plasma and reacting the second material to form a second layer comprising an inorganic ultraviolet absorbing material on the interlayer, the second material comprising a gaseous reagent, wherein the interlayer has a coefficient of thermal expansion that is between that of the substrate and the second layer.

2. The method of claim 1, wherein the the second material comprises an evaporated elemental metal.

3. The method of claim 1, further comprising the step of injecting a third material into the plasma to form a third layer and reacting the third material to form a third layer comprising an abrasion resistant material on the second layer.

4. The method of claim 3, wherein the first material comprises a first organosilicon material, the second material comprises an evaporated elemental metal, and the third material comprises a second organosilicon material, and the method further comprises the step of injecting a third oxidant with the third material.

5. The method of claim 4, wherein the first material comprises at least one of octamethylcyclotetrasiloxane, tetramethyldisiloxane, and hexamethyldisiloxane, the second material comprises zinc, and the third material comprises at least one of octamethylcyclotetrasiloxane, tetramethyldisiloxane, and hexamethyldisiloxane.

6. The method of claim 3, wherein the first material comprises a hydrocarbon.

7. The method of claim 3, wherein the second material comprises an evaporated elemental metal.

8. The method of claim 7, wherein the second material comprises at least one of zinc and indium.

9. The method of claim 7, wherein the second material comprises zinc, and the method further comprises the step of injecting sulfur with the zinc.

10. The method of claim 4, wherein the substrate comprises a polycarbonate.

11. The method of claim 3, wherein the second layer comprises an ultraviolet absorbing material having an ultraviolet absorbance value of at least 1.0.

12. The method of claim 11, wherein the second layer comprises an ultraviolet absorbing material and wherein the ultraviolet absorbance value is at least 2.0.

13. The method of claim 11, wherein the abrasion resistant material has a delta haze value of at most 4.0 percent.

14. The method of claim 12, wherein the abrasion resistant material has a delta haze value of at most 2.0 percent.

15. The method of claim 1, wherein the substrate comprises glass.

16. The method of claim 3, wherein the second material comprises at least one of elemental zinc, elemental indium, and elemental aluminum.