Method for fabricating a structure for a microelectromechanical systems (MEMS) device

  • US 6,794,119 B2
  • Filed: 02/12/2002
  • Issued: 09/21/2004
  • Est. Priority Date: 02/12/2002
  • Status: Expired due to Fees
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First Claim
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1. A microfabrication process for fabricating a microelectromechanical systems device, comprising:

  • depositing one or a stack of layers on a substrate;

    patterning said one or a stack of layers to form a plurality of longitudinally extending groves therein;

    depositing a middle layer on said one or a stack of layers;

    patterning the middle layer using said one or a stack of layers as a photomask, wherein said middle layer is exposed to light passed through the groves in the one or a stack of layers; and

    developing said middle layer to form longitudinally spaced ridges in the said middle layer disposed in the groves in said one or a stack of layers, said ridges forming a support structure which is part of the microelectromechanical systems device.

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