Method for fabricating a structure for a microelectromechanical systems (MEMS) device
First Claim
Patent Images
1. A microfabrication process for fabricating a microelectromechanical systems device, comprising:
- depositing one or a stack of layers on a substrate;
patterning said one or a stack of layers to form a plurality of longitudinally extending groves therein;
depositing a middle layer on said one or a stack of layers;
patterning the middle layer using said one or a stack of layers as a photomask, wherein said middle layer is exposed to light passed through the groves in the one or a stack of layers; and
developing said middle layer to form longitudinally spaced ridges in the said middle layer disposed in the groves in said one or a stack of layers, said ridges forming a support structure which is part of the microelectromechanical systems device.
5 Assignments
0 Petitions
Accused Products
Abstract
The invention provides a microfabrication process which may be used to manufacture a MEMS device. The process comprises depositing one or a stack of layers on a base layer, said one layer or an uppermost layer in said stack of layers being a sacrificial layer; patterning said one or a stack of layers to provide at least one aperture therethrough through which said base layer is exposed; depositing a photosensitive layer over said one or a stack of layers; and passing light through said at least one aperture to expose said photosensitive layer.
715 Citations
15 Claims
-
1. A microfabrication process for fabricating a microelectromechanical systems device, comprising:
-
depositing one or a stack of layers on a substrate;
patterning said one or a stack of layers to form a plurality of longitudinally extending groves therein;
depositing a middle layer on said one or a stack of layers;
patterning the middle layer using said one or a stack of layers as a photomask, wherein said middle layer is exposed to light passed through the groves in the one or a stack of layers; and
developing said middle layer to form longitudinally spaced ridges in the said middle layer disposed in the groves in said one or a stack of layers, said ridges forming a support structure which is part of the microelectromechanical systems device. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
-
-
10. A method for fabricating a microelectromechanical systems device, the method comprising:
-
a) depositing one or a stack of layers on a base layer, said one layer or an uppermost layer in said stack of layers being a sacrificial layer;
b) patterning said one or a stack of layers to provide at least one aperture therethrough through which said base layer is exposed;
c) depositing a photosensitive layer over said one or a stack of layers;
d) passing light through said at least one aperture to expose said photosensitive layer; and
e) developing said one or a stack of layers to remove unexposed portions of said photosensitive layer and said sacrificial layer to form at least one mechanical support, each support being defined by a portion of said photosensitive layer exposed through an aperture. - View Dependent Claims (11, 12, 13, 14, 15)
-
Specification