Semiconductor integrated circuit device and method for fabricating the same

DC
  • US 6,794,677 B2
  • Filed: 09/28/2001
  • Issued: 09/21/2004
  • Est. Priority Date: 10/02/2000
  • Status: Expired due to Term
First Claim
Patent Images

1. A semiconductor integrated circuit device comprising:

  • a first circuit pattern having a first linear pattern and placed in a region in which a group of elements having a repetitive pattern are formed; and

    a second circuit pattern having a second linear pattern and placed in a region in which components other than the group of elements are formed, a dummy pattern being inserted in the region in which the second circuit pattern is placed such that a sum perimeter of the first linear pattern, the second linear pattern, and the dummy pattern per unit area is equal to or less than a perimeter of the first linear pattern per unit area.

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