Innovative method of hard mask removal

  • US 6,809,033 B1
  • Filed: 11/07/2001
  • Issued: 10/26/2004
  • Est. Priority Date: 11/07/2001
  • Status: Expired due to Term
First Claim
Patent Images

1. A method of stripping a hard mask from a substrate comprising an insulating material exposed within gaps patterned through the hard mask, comprising:

  • coating the substrate with a sacrificial material that fills the gaps; and

    plasma etching to strip the sacrificial material and the hard mask substantially completely from the gaps in a single plasma etch process.

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