Optical multilayer structure and its production method, optical switching device, and image display

• US 6,850,365 B2
• Filed: 07/12/2002
• Issued: 02/01/2005
• Est. Priority Date: 07/12/2001
• Status: Expired due to Term

• Current Assignee: Sony Corporation (Sony Group Corp.)
• Original Assignee: Sony Corporation (Sony Group Corp.)
• Inventors: Ishikawa, Hiroichi
• Primary Examiner(s): BOUTSIKARIS, LEONIDAS
• Application Number:
  US10/380,224
• Publication Number:
  US 20040027701A1
• Time in Patent Office: 935 Days
• Field of Search: 359577-579, 359/584, 359/586, 359/589, 359/247, 359/248, 359/290, 359/291, 385/16, 385/18
• US Class Current: 359/586
• CPC Class Codes: G02B 26/001 based on interference in an adjustable optical cavity interference filters G02B5/28; devices or arrangements using multiple reflections in spectrometry or monochromators G01J3/26
• CPC Class Codes: G02B 26/02 for controlling the intensity of light G02B26/004 takes precedence
• CPC Class Codes: G02B 26/0833 the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD G02B26/0825 takes precedence; micromechanical devices in general B81B
• CPC Class Codes: G02B 26/0841 the reflecting element being moved or deformed by electrostatic means
• CPC Class Codes: G02B 26/085 the reflecting means being moved or deformed by electromagnetic means

Abstract

Provided is an optical multilayer structure having a simpler configuration, flexibility in selection of materials and improved reliability in wiring and capable of high-speed response even in a visible light range. A optical multilayer structure (1) has a first layer (11) being light-absorptive and making contact with a substrate (10), a gap portion (12) having as large a size as light interference phenomenon can occur and being capable of varying the size, and a second layer (13) being transparent in this order on the substrate (10). Where a complex refractive index of the first layer (11) is N₁ (=n₁−i·k₁, n₁ is a refractive index, k₁ is an extinction coefficient, and i is an imaginary unit), a refractive index of the second layer (13) is n₂, and a refractive index of an incident medium is 1.0, the optical multilayer structure (1) is configured so as to satisfy the following formula. ${\left(n_1-\frac{n_2^{2}1}{2}\right)}^2{k}_1^2-{\left(\frac{n_2^2-1}{2}\right)}^2=0.$

Claims

1. An optical multilayer structure, comprising:

a configuration including a first layer being light-absorptive, a gap portion with a size between an odd multiple of λ

/4 (λ

is a wavelength of incident light) and an even multiple (including

     0) of λ

/4, the size being variable, and a second layer being transparent disposed in this order on a substrate, wherein a complex refractive index of the first layer is N₁ (=n₁−

ik₁, n₁ is a refractive index, k₁ is an extinction coefficient, and i is an imaginary unit), a refractive index of the second layer is n₂, and a refractive index of an incident medium is 1.0, a relationship of Mathematical Formula 3 is satisfied;

(n₁−

(n₂²

     1)/2)² k₁²−

((n₂²−

1)/2)²=0. 

 

(Mathematical Formula

     3)

3. An optical multilayer structure according to claim 1 or claim 2, wherein

the substrate is formed of a transparent material or a semi-transparent material.

4. An optical multilayer structure according to claim 1, further comprising:

a driving means for varying an optical size of the gap portion, wherein

the driving means varies the size of the gap portion so as to vary an amount of reflection, transmittance or absorption of incident light.

5. An optical multilayer structure according to claim 4, wherein

the driving means varies the optical size of the gap portion between an odd multiple of λ

/4 and an even multiple (including

     0) of λ

/4 in a binary or continuous manner so as to vary the amount of reflection, transmission or absorption of the incident light in a binary or continuous manner.

6. An optical multilayer structure according to claim 1, wherein

at least one of the first layer or the second layer is a complex layer including two or more layers with different optical properties from each other.

7. An optical multilayer structure according to claim 1, wherein

the first layer is formed of a nitride material.

8. An optical multilayer structure according to claim 7, wherein

the nitride material is formed of one selected from the group consisting of titanium nitride, tantalum nitride, hafnium nitride and zirconium nitride.

9. An optical multilayer structure according to claim 4, wherein

at least one of the first layer or the second layer partially includes a transparent conductive film, and the driving means varies the optical size of the gap portion by an electrostatic force generated by application of voltage to the transparent conductive film.

10. An optical multilayer structure according to claim 9, wherein

the transparent conductive film is formed of one selected from the group consisting of ITO, SnO₂ and ZnO.

11. An optical multilayer structure according to claim 1, wherein

an optical thickness of the second layer is λ

/4 (λ

is a designed wavelength of incident light) or less.

12. An optical multilayer structure according to claim 4, wherein the driving means varies the optical size of the gap portion by a magnetic force.

2. An optical multilayer structure, comprising:

a configuration including a gap portion with a size between an odd multiple of λ

/4 (λ

is a wavelenght of incident light) and an even multiple (including

     0) of λ

/4, the size being variable, and a transparent layer disposed in this order on a substrate being light-absorptive,

wherein where a complex refractive index of the substrate is N₁ (=n₁−

i·

k₁, n₁ is a refractive index, k₁ is an extinction coefficient, and i is an imaginary unit), a refractive index of the transparent layer is n₂, and a refractive index of an incident medium is 1.0, a relationship of Mathematical Formula 4 is satisfied. $\begin{array}{cc}{\left(n_1-\frac{n_2^{2}1}{2}\right)}^2{k}_1^2-{\left(\frac{n_2^2-1}{2}\right)}^2=0.& \left(\mathrm{Mathematical}<br><br>\text{\hspace{1em}<br><br>}<br><br>\mathrm{Formula}<br><br>\text{\hspace{1em}<br><br>}<br><br>4\right)\end{array}$

23. An optical multilayer structure according to claim 2, further comprising:

a driving means for varying an optical size of the gap portion, wherein

the driving means varies the size of the gap portion so as to vary an amount of reflection, transmittance or absorption of incident light.

13. An optical switching device, comprising:

an optical multilayer structure including a first layer being light-absorptive, a gap portion with a size between an odd multiple of λ

/4 (λ

is a wavelength of incident light) and an even multiple (including

     0) of λ

/4, the size being variable, and a second layer being transparent disposed in this order on a substrate, and a driving means for varying an optical size of the gap portion, wherein a complex refractive index of the first layer is N₁ (=n₁−

ik₁, n₁ is a refractive index, k₁ is an extinction coefficient, and i is an imaginary unit), a refractive index of the second layer is n₂, and a refractive index of an incident medium is 1.0, a relationship of Mathematical Formula 5 is satisfied;

(n₁−

(n₂²

     1)/2)² k₁²−

((n₂²−

1)/2))²=0. 

 

(Mathematical Formula

     5)

14. An optical switching device, comprising:

an optical multilayer structure including a gap portion with a size between an odd multiple of λ

/4 (λ

is a wavelength of incident light) and an even multiple (including

     0) of λ

/4, the size being variable, and a transparent layer disposed in this order on a substrate being light-absorptive; and

a driving means for varying an optical size of the gap portion,

wherein where a complex refractive index of the substrate is N₁ (=n₁−

i·

k₁, n₁ is a refractive index, k₁ is an extinction coefficient, and i is an imaginary unit), a refractive index of the transparent layer is n₂, and a refractive index of an incident medium is 1.0, a relationship of Mathematical Formula 6 is satisfied. $\begin{array}{cc}{\left(n_1-\frac{n_2^{2}1}{2}\right)}^2{k}_1^2-{\left(\frac{n_2^2-1}{2}\right)}^2=0.& \left(\mathrm{Mathematical}<br><br>\text{\hspace{1em}<br><br>}<br><br>\mathrm{Formula}<br><br>\text{\hspace{1em}<br><br>}<br><br>6\right)\end{array}$

15. An image display apparatus for displaying a two-dimensional image through irradiating a plurality of optical switching devices one-dimensionally or two-dimensionally arranged with light,

each of the optical switching devices comprising:

an optical multilayer structure including a first layer being light-absorptive, a gap portion with a size between an odd multiple of λ

/4 (λ

is a wavelength of incident light) and an even multiple (including

     0) of λ

/4, the size being variable, and a second layer being transparent disposed in this order on a substrate; and

a driving means for varying an optical size of the gap portion, wherein a complex refractive index of the first layer is N₁ (=n₁−

ik₁, n₁ is a refractive index, k₁ is an extinction coefficient, and i is an imaginary unit), a refractive index of the second layer is n₂, and a refractive index of an incident medium is 1.0, a relationship of Mathematical Formula 7 is satisfied;

(n₁−

(n₂²

     1)/2)² k₁²−

((n₂²−

1)/2))²=0. 

 

(Mathematical Formula

     7)

16. An image display apparatus for displaying a two-dimensional image through irradiating a plurality of optical switching devices one-dimensionally or two-dimensionally arranged with light,

each of the optical switching devices comprising:

an optical multilayer structure including a gap portion with a size between an odd multiple of λ

/4 (λ

is a wavelength of incident light) and an even multiple (including

     0) of λ

/4, the size being variable, and a transparent layer disposed in this order on a substrate being light-absorptive; and

a driving means for varying an optical size of the gap portion,

wherein where a complex refractive index of the substrate is N₁ (=n₁−

i·

k₁, n₁ is a refractive index, k₁ is an extinction coefficient, and i is an imaginary unit), a refractive index of the transparent layer is n₂, and a refractive index of an incident medium is 1.0, a relationship of Mathematical Formula 8 is satisfied $\begin{array}{cc}{\left(n_1-\frac{n_2^{2}1}{2}\right)}^2{k}_1^2-{\left(\frac{n_2^2-1}{2}\right)}^2=0.& \left(\mathrm{Mathematical}<br><br>\text{\hspace{1em}<br><br>}<br><br>\mathrm{Formula}<br><br>\text{\hspace{1em}<br><br>}<br><br>8\right)\end{array}$

17. A method of manufacturing an optical multilayer structure,

the optical multilayer structure including a first layer being light-absorptive, a gap portion with a size between an odd multiple of λ

/4 (λ

is a wavelength of incident light) and an even multiple (including

     0) of λ

/4, the size being variable, and a second layer being transparent disposed in this order on a substrate, wherein a complex refractive index of the first layer is N₁ (=n₁−

ik₁, n₁ is a refractive index, k₁ is an extinction coefficient, and i is an imaginary unit), a refractive index of the second layer is n₂, and a refractive index of an incident medium is 1.0, a relationship of Mathematical Formula 9 is satisfied,

the method comprising the step of;

forming a sacrificial layer on the first layer after forming the first layer on the substrate, and then forming the second layer on the sacrificial layer, and after that, selectively removing the sacrificial layer to form the gap portion;

(n₁−

(n₂²

     1)/2)² k₁²−

((n₂²−

1)/2))²=0. 

 

(Mathematical Formula

     9)

19. A method of manufacturing an optical multilayer structure according to claim 17 or claim 18, wherein

the sacrificial layer is selectively removed through etching with a dry gas.

20. A method of manufacturing an optical multilayer structure according to claim 17, wherein

the sacrificial layer is selectively removed through etching with a dry gas, and the first layer is formed of a material resistant to the dry gas.

22. A method of manufacturing an optical multilayer structure according to claim 20 or claim 21, wherein

the sacrificial layer is formed of silicon (Si), and xenon difluoride (XeF₂) is used as an etching gas.

18. A method of manufacturing an optical multilayer structure, the optical multilayer structure including a gap portion with a size between an odd multiple of λ

/4 (λ

is a wavelength of incident light) and an even multiple (including

     0) of λ

/4, the size being variable, and a transparent layer disposed in this order on a substrate being light-absorptive, wherein where a complex refractive index of the substrate is N₁ (=n₁−

i·

k₁, n₁ is a refractive index, k₁ is an extinction coefficient, and i is an imaginary unit), a refractive index of the transparent layer is n₂, and a refractive index of an incident medium is 1.0, a relationship of Mathematical Formula 10 is satisfied,

the method comprising the step of;

forming a sacrificial layer on the substrate, and then forming the transparent layer on the sacrificial layer, and after that, selectively removing the sacrificial layer to form the gap portion. $\begin{array}{cc}{\left(n_1-\frac{n_2^{2}1}{2}\right)}^2{k}_1^2-{\left(\frac{n_2^2-1}{2}\right)}^2=0.& \left(\mathrm{Mathematical}<br><br>\text{\hspace{1em}<br><br>}<br><br>\mathrm{Formula}<br><br>\text{\hspace{1em}<br><br>}<br><br>10\right)\end{array}$

21. A method of manufacturing an optical multilayer structure according to claim 18, wherein

the sacrificial layer is selectively removed through etching with a dry gas, and the substrate is formed of a material resistant to the dry gas.