Positioning system for use in lithographic apparatus
First Claim
Patent Images
1. A lithographic projection apparatus comprising:
- a patterning structure which can be used to pattern a projection beam according to a desired pattern;
a substrate table constructed and arranged to support a substrate;
a projection system constructed and arranged to image the patterned beam onto target portions of the substrate, an object table positioning system constructed and arranged to position at least one of said patterning structure and said substrate table in a plane, said object table positioning system including;
a first side-beam having a first slider mounted thereon;
a first motor that moves the first slider along the first side beam;
a cross-beam mounted near a first end thereof to said first slider and having a second slider mounted thereon, said cross-beam and said first slider being mounted together so as to form a body that is substantially rigid in translation in said plane and in rotation about an axis normal to said plane, and said second slider having an object holder to hold the at least one of said patterning structure and said substrate table; and
a thrust bearing pivotally mounted to said first slider, said thrust bearing transmitting a force in said plane and substantially perpendicular to said first side beam between said cross-beam and said first side beam.
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Abstract
A positioning system, such as may be used to position a moveable object table in three degrees of freedom. More particularly, the invention relates to the use of the positioning system in a lithographic projection apparatus including an illumination system for supplying a projection beam of radiation, a first object table for holding a mask, a second, movable object table for holding a substrate, and a projection system for imaging an irradiated portion of the mask onto a target portion of the substrate.
32 Citations
25 Claims
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1. A lithographic projection apparatus comprising:
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a patterning structure which can be used to pattern a projection beam according to a desired pattern;
a substrate table constructed and arranged to support a substrate;
a projection system constructed and arranged to image the patterned beam onto target portions of the substrate, an object table positioning system constructed and arranged to position at least one of said patterning structure and said substrate table in a plane, said object table positioning system including;
a first side-beam having a first slider mounted thereon;
a first motor that moves the first slider along the first side beam;
a cross-beam mounted near a first end thereof to said first slider and having a second slider mounted thereon, said cross-beam and said first slider being mounted together so as to form a body that is substantially rigid in translation in said plane and in rotation about an axis normal to said plane, and said second slider having an object holder to hold the at least one of said patterning structure and said substrate table; and
a thrust bearing pivotally mounted to said first slider, said thrust bearing transmitting a force in said plane and substantially perpendicular to said first side beam between said cross-beam and said first side beam. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18)
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19. A lithographic projection apparatus comprising:
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a patterning structure which can be used to pattern a projection beam according to a desired pattern;
a substrate table constructed and arranged to support a substrate;
a projection system constructed and arranged to image the patterned beam onto target portions of the substrate, an object table positioning system constructed and arranged to position at least one of said patterning structure and said substrate table in a plane, said object table positioning system including;
first and second side-beams having respective first and second sliders mounted thereon;
first and second motors that move said first and second sliders longitudinally to their respective side beams;
a cross-beam mounted near first and second ends thereof to said first and second sliders respectively and having a third slider mounted thereon, said cross-beam and said first and second sliders being mounted together so as to form a body that is substantially rigid in translation in said plane and in rotation about an axis normal to said plane, and said third slider having an object holder to hold the at least one of said patterning structure and said substrate table; and
a thrust bearing pivotally mounted to said first slider, said thrust bearing comprising a bearing assembly which acts against a bearing wall of said first side-beam. - View Dependent Claims (20, 21, 22)
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23. A method of manufacturing a device comprising:
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irradiating portions of a mask and imaging said irradiated portions of the mask onto target portions of a substrate; and
positioning one of a mask bearing moveable object table and a substrate bearing movable object table in a plane prior to or during said irradiating and imaging with a positioning apparatus including;
a first side-beam having a first slider mounted thereon;
a first motor that moves the first slider along the first side beam;
a cross-beam mounted near a first end thereof to said first slider and having a second slider mounted thereon, said cross-beam and said first slider being mounted together so as to form a body that is substantially rigid in translation in said plane and in rotation about an axis normal to said plane, and said second slider having an object holder to hold the at least one of said patterning structure and said substrate table; and
a thrust bearing pivotally mounted to said first slider, said thrust bearing transmitting a force in said plane and substantially perpendicular to said first side beam between said cross-beam and said first side beam. - View Dependent Claims (24)
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25. A positioning apparatus for positioning a moveable object translationally and rotationally in a plane, the apparatus comprising:
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a first side-beam having a first slider mounted thereon;
a first motor that moves the first slider along the first side beam;
a cross-beam mounted near a first end thereof to said first slider and having a second slider mounted thereon, said cross-beam and said first slider being mounted together so as to form a body that is substantially rigid in translation in said plane and in rotation about an axis normal to said plane, and said second slider having an object holder to hold the at least one of said patterning structure and said substrate table; and
a thrust bearing pivotally mounted to said first slider, said thrust bearing transmitting a force in said plane and substantially perpendicular to said first side beam between said cross-beam and said first side beam.
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Specification