Process for producing a light emitting device
First Claim
Patent Images
1. A process for producing a light emitting device comprising the steps of:
- forming an anode comprising a transparent oxide film;
wiping and cleaning the surface of the anode with a wiping and cleaning material;
forming an organic compound layer on the anode after wiping and cleaning the surface of thereof; and
forming a cathode on the organic compound layer.
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Abstract
The surface of an anode is made flat by wiping/cleaning of the present invention. Thereafter, an organic compound layer and a cathode are formed to produce a light emitting element. In this way, the distance between the anode and the cathode becomes constant. Therefore, when an electric field is applied to the light emitting element, the current density in the organic compound layer becomes uniform. Thus, it is possible to prevent the deterioration of the organic compound layer and improve the element characteristic thereof.
45 Citations
77 Claims
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1. A process for producing a light emitting device comprising the steps of:
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forming an anode comprising a transparent oxide film;
wiping and cleaning the surface of the anode with a wiping and cleaning material;
forming an organic compound layer on the anode after wiping and cleaning the surface of thereof; and
forming a cathode on the organic compound layer. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. A process for producing an active matrix type light emitting device comprising the steps of:
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forming TFTs over a substrate;
forming a first insulating film comprising organic resin material over the TFTs;
forming a second insulating film comprising inorganic insulating material on the first insulating film;
forming a transparent conductive film on the second insulating film; and
wiping and cleaning the surface of the transparent conductive film with a wiping and cleaning material.
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9. A process for producing an active matrix type light emitting device comprising the steps of:
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forming a thin film transistor over a substrate;
forming a first insulating film comprising organic resin material over the thin film transistor;
forming a second insulating film comprising inorganic insulating material on the first insulating film;
forming an anode on the second insulating film; and
wiping and cleaning the surface of the anode with a wiping and cleaning material. - View Dependent Claims (10, 11, 12, 13, 14, 15, 16)
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17. A process for producing a light emitting device comprising the steps of:
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forming a transparent conductive film;
forming an insulating film comprising an organic resin material on the transparent conductive film; and
wiping and cleaning the surface of the insulating film with a wiping and cleaning material. - View Dependent Claims (18, 19, 20, 21, 22, 23, 24)
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25. A process for producing a light emitting device comprising the steps of:
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forming an anode;
forming an insulating film comprising an organic resin material on the anode; and
wiping and cleaning the surface of the insulating film with a wiping and cleaning material.
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26. A process for producing an active matrix type light emitting device comprising the steps of:
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forming TFTs over a substrate;
forming a first insulating film comprising an organic resin material over the TFTs;
forming a second insulating film comprising an inorganic insulating material on the first insulating film;
forming a transparent conductive film on the second insulating film;
forming a third insulating film comprising an organic resin material on the transparent conductive film; and
wiping and cleaning the surface of the third insulating film with a wiping and cleaning material. - View Dependent Claims (27, 28, 29, 30, 31, 32, 33, 34, 35, 36)
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37. A process for producing an active matrix type light emitting device comprising the steps of:
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forming TFTs over a substrate;
forming a first insulating film comprising an organic resin material over the TFTs;
forming a second insulating film comprising an inorganic insulating material on the first insulating film;
forming an anode on the second insulating film;
forming a third insulating film comprising an organic resin material on the anode; and
wiping and cleaning the surface of the third insulating film with a wiping and cleaning material.
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38. A process for producing an active matrix type light emitting device comprising the steps of:
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forming a thin film transistor over a substrate;
forming a first insulating film comprising organic resin material over the thin film transistor;
forming a second insulating film comprising inorganic insulating material on the first insulating film;
forming a transparent conductive film formed on the second insulating film;
patterning the transparent conductive film to form an anode; and
wiping and cleaning the surface of the anode with a wiping and cleaning material. - View Dependent Claims (39, 40, 41, 42, 43, 44, 45)
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46. A process for producing an active matrix light emitting device comprising the steps of:
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forming a thin film transistor over a substrate;
forming a first insulating film comprising organic resin material over the thin film transistor;
forming a second insulating film comprising inorganic material on the first insulating film;
forming an electrode connected to the thin film transistor on the second insulating film;
forming an anode formed on the electrode and the second insulating film; and
wiping and cleaning the surface of the anode with a wiping and cleaning material. - View Dependent Claims (47, 48, 49, 50, 51, 52, 53)
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54. A process for producing an active matrix type light emitting device comprising the steps of:
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forming a thin film transistor over a substrate;
forming a first insulating film comprising organic resin material over the thin film transistor;
forming a second insulating film comprising inorganic insulating material on the first insulating film;
forming an anode on the second insulating film;
wiping and cleaning the surface of the anode with a wiping and cleaning material; and
forming an organic compound layer on the wiped and cleaned surface of the anode. - View Dependent Claims (55, 56, 57, 58, 59, 60, 61)
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62. A process for producing an active matrix type light emitting device comprising the steps of:
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forming a thin film transistor over a substrate;
forming a first insulating film over the thin film transistor;
forming a second insulating film on the first insulating film;
forming an anode comprising a transparent conductive film on the second insulating film; and
wiping and cleaning the surface of the anode with a wiping and cleaning material. - View Dependent Claims (63, 64, 65, 66, 67, 68, 69)
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70. A process for producing an active matrix type light emitting device comprising the steps of:
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forming a thin film transistor over a substrate;
forming a first insulating film over the thin film transistor;
forming a second insulating film on the first insulating film;
forming an anode on the second insulating film;
wiping and cleaning the surface of the anode with a wiping and cleaning material; and
forming an organic compound layer on the wiped and cleaned surface of the anode. - View Dependent Claims (71, 72, 73, 74, 75, 76, 77)
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Specification