EUV mask blank defect mitigation
First Claim
Patent Images
1. An EUV mask structure comprising:
- a substrate layer;
a reflective multilayer;
a polyimide layer between the substrate layer and reflective multilayer.
2 Assignments
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Abstract
A solution for mitigating the effects of EUV substrate surface defects is disclosed. In one embodiment, a layer of polyimide material is formed upon a mask substrate surface, resulting in a substantially defect free surface adjacent to which a reflective multilayer may be positioned for EUV lithography. To reduce the possibility of polyimide outgassing and resultant added roughness to adjacently positioned layers, the layer of polyimide may be cured in a vacuum at an elevated temperature before other layers are adjacently positioned.
16 Citations
20 Claims
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1. An EUV mask structure comprising:
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a substrate layer;
a reflective multilayer;
a polyimide layer between the substrate layer and reflective multilayer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
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12. A method to form an EUV mask structure comprising:
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minimizing defect geometry defined by a substrate surface;
depositing a layer of polyimide precursor material upon the substrate surface;
curing the polyimide precursor material to form a cured polyimide layer;
forming a reflective multilayer adjacent the cured polyimide layer. - View Dependent Claims (13, 14, 15, 16, 17, 18, 19, 20)
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Specification