Transparent article having protective silicon nitride film
First Claim
1. A transparent article comprising a transparent, non-metallic substrate and a transparent film stack deposited upon the substrate, said film stack comprising, in sequence, an inner dielectric film, a first metal film, a middle dielectric film, a second metal film, an outer dielectric film of metal oxide, and a protective film of silicon nitride having a thickness in the range of 10 Å
- to 10 Å
.
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Accused Products
Abstract
Transparent articles comprising transparent, nonmetallic substrate and a transparent film stack is sputter deposited on the substrate. The film stack is characterized by including at least one infrared reflective metal film, a dielectric film over the metal film, and a protective silicon nitride film of 10 Å to 150 Å in thickness over the said dielectric film. The dielectric film desirably has substantially the same index of refraction as does silicon nitride and is contiguous with the silicon nitride film.
73 Citations
21 Claims
- 1. A transparent article comprising a transparent, non-metallic substrate and a transparent film stack deposited upon the substrate, said film stack comprising, in sequence, an inner dielectric film, a first metal film, a middle dielectric film, a second metal film, an outer dielectric film of metal oxide, and a protective film of silicon nitride having a thickness in the range of 10 Å
-
11. A transparent article comprising a transparent, non-metallic substrate and a transparent film stack deposited upon the substrate, said film stack comprising, in sequence, an inner dielectric film, a first metal film, a middle dielectric film, a second metal film, an outer dielectric film of metal oxide, and a protective film of silicon nitride having a thickness in the range of 10 to 100 Å
- , wherein said outer dielectric oxide film and said protective silicon nitride film are contiguous and have a combined thickness in the range of about 250 Å
to 400 Å
. - View Dependent Claims (12, 13, 14, 15)
- , wherein said outer dielectric oxide film and said protective silicon nitride film are contiguous and have a combined thickness in the range of about 250 Å
- 16. A transparent article comprising a transparent, non-metallic substrate and a transparent film stack deposited upon the substrate, said film stack comprising, in sequence, a first film of zinc oxide, a first film of silver, a first shielding film of titanium oxide, a second film of zinc oxide, a second film of silver, a second shielding film of titanium oxide, a third film of zinc oxide, and a protective film of silicon nitride having a thickness in the range of 10 to 100 Å
-
21. A transparent article comprising a transparent, non-metallic substrate and a transparent film stack deposited upon the substrate, said film stack comprising, in sequence, an inner dielectric film, a first silver film, a middle dielectric film, a second silver film, an outer dielectric film of metal oxide, and a protective film of silicon nitride having a thickness in the range of 10 to 100 Å
- , wherein said outer dielectric oxide film and said protective silicon nitride are contiguous and have a combined thickness in the range of about 250 Å
to 400 Å
.
- , wherein said outer dielectric oxide film and said protective silicon nitride are contiguous and have a combined thickness in the range of about 250 Å
Specification