Vapor deposition of metal oxides, silicates and phosphates, and silicon dioxide

  • US 6,969,539 B2
  • Filed: 09/28/2001
  • Issued: 11/29/2005
  • Est. Priority Date: 09/28/2000
  • Status: Expired due to Term
First Claim
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1. A process for forming materials comprising silicon, oxygen and one or more metals or metalloids, comprising:

  • reacting the vapor of one of an alkoxysilanol and an alkoxysilanediol together with a vapor of one or more of a metal compound and a metalloid compound.

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