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Treatment method of film quality for the manufacture of substrates

  • US 6,969,668 B1
  • Filed: 11/08/2000
  • Issued: 11/29/2005
  • Est. Priority Date: 04/21/1999
  • Status: Active Grant
First Claim
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1. A method of fabricating substrates, the method comprising:

  • providing a substrate comprising a film of material characterized by a non-uniform surface, the non-uniform surface including a plurality of defects, at least some of the defects being of a size ranging from about 100 Angstroms and greater; and

    applying a combination of a deposition species for deposition of a deposition material and an etching species for etching an etchable material during a portion of time that the non-uniform surface is subjected to the etching, the combination of the deposition species and the etching species contacting the non-uniform surface in a thermal setting to reduce a level of non-uniformity of the non-uniform surface by filling a portion of the defects to smooth the film of material, the film of material being substantially free from the defects and being characterized by a surface roughness of a predetermined value.

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