System and method for inductive coupling of an expanding thermal plasma
First Claim
1. A method for generating plasma using a plasma generator system, said method comprising the steps of:
- introducing energy and a reactant to a plasma generation apparatus of the plasma generator system for generating plasma;
receiving the generated plasma in a plasma treatment chamber;
expanding and inductively coupling the generated plasma, wherein the step of inductively coupling comprises the steps of providing at least one electric coil in proximity to the generated plasma and energizing the at least one electric coil;
providing a substrate having at least one surface;
using the expanded and inductively coupled plasma to coat the surface of the substrate with at least one coating having a particular configuration; and
positioning the at least one electric coil in a particular configuration for generating a particular deposition profile corresponding to the particular configuration for the at least one coating on the surface of the substrate.
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Accused Products
Abstract
A method is provided for generating plasma using a plasma generator system. The method includes the steps of introducing energy and a reactant to a plasma generation apparatus of the plasma generator system for generating plasma, and expanding and inductively coupling the generated plasma. In another embodiment a plasma generation system is provided including a plasma generation apparatus for generating thermal plasma. The thermal plasma is received by a plasma treatment chamber external to the plasma generation apparatus. A pressure control system maintains a lower pressure in the plasma treatment chamber than in the plasma generation apparatus during plasma generation for causing the thermal plasma to expand within the plasma treatment chamber. An inductor system inductively couples the thermal plasma.
25 Citations
15 Claims
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1. A method for generating plasma using a plasma generator system, said method comprising the steps of:
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introducing energy and a reactant to a plasma generation apparatus of the plasma generator system for generating plasma; receiving the generated plasma in a plasma treatment chamber; expanding and inductively coupling the generated plasma, wherein the step of inductively coupling comprises the steps of providing at least one electric coil in proximity to the generated plasma and energizing the at least one electric coil; providing a substrate having at least one surface; using the expanded and inductively coupled plasma to coat the surface of the substrate with at least one coating having a particular configuration; and positioning the at least one electric coil in a particular configuration for generating a particular deposition profile corresponding to the particular configuration for the at least one coating on the surface of the substrate. - View Dependent Claims (2, 3, 4, 5, 6)
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7. A plasma generation system comprising:
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a plasma generation apparatus for generating thermal plasma; a plasma treatment chamber external to said plasma generation apparatus receiving the thermal plasma from the plasma generation apparatus; a pressure control system for maintaining a lower pressure in the plasma treatment chamber than in the plasma generation apparatus during plasma generation for causing the thermal plasma to expand within the plasma treatment chamber; and an inductor system for inductively coupling the thermal plasma, wherein the inductor system includes at least one electric coil in proximity to the thermal plasma and a power source for energizing the at least one electric coil, wherein the expanded and inductively coupled plasma is directed towards a surface of a substrate within the plasma treatment chamber for coating the surface with at least one coating and wherein the at least one electric coil is positioned within the palsma treatment chamber in a particular configuration for generating a particular deposition profile corresponding to the particular configuration for the at least one coating on the surface of the substrate. - View Dependent Claims (8, 9, 10)
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11. A plasma generation system comprising:
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an apparatus for generating a plasma; an apparatus for receiving the generated plasma and providing for expansion of the generated plasma; and an apparatus for inductively coupling the generated plasma, wherein the apparatus for receiving and the apparatus for inductively coupling together form the generated plasma into an inductively coupled and expanded plasma, wherein the apparatus for inductively coupling the generated plasma includes at least one electric coil in proximity to to the generated plasma, wherein the expanded and inductively coupled plasma is directed towards a surface of a substrate within the apparatus for receiving the generated plasma for coating the surface with at least one coating, and wherein the at least one electric coil is positioned within the apparatus for receiving the generated plasma in a particular configuration for generating a particular deposition profile corresponding to the particular configuration for the at least one coating on the surface of the substrate. - View Dependent Claims (12)
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13. A plasma generator system comprising:
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means for generating plasma by introducing energy and a reactant to the plasma generator system; means for receiving the generated plasma in a plasma treatment chamber; and means for expanding and inductively coupling the generated plasma;
wherein the means for inductively coupling the generated plasma comprises at least one electric coil in proximity to the generated plasma and energizing the at least one electric coil using a power source, wherein the expanding inductively coupled plasma is directed towards a surface of a substrate within the plasma treatment chamber for coating the surface with at least one coating and wherein the at least one electric coil is positioned within the plasma treatment chamber in a particular configuration for generating a particular deposition profile corresponding to the particular configuration for the at least one coating on the surface of the substrate.
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14. An expanding inductively coupled plasma, said plasma generated by the method comprising the steps of:
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introducing energy and a reactant to a plasma generation apparatus of a plasma generator system for generating plasma; receiving a generated plasma in a plasma treatment chamber; and expanding and inductively coupling the generated plasma, wherein inductively coupling comprises positioning at least one electric coil in proximity to the generated plasma and energizing the at least one electric coil using a power source, wherein the expanding inductively coupled plasma is directed towards a surface of a substrate within the plasma treatment chamber for coating the surface with at least one coating and wherein the at least one electric coil is positioned within the plasma treatment chamber in a particular configuration for generating a particular deposition profile corresponding to the particular configuration for the at least one coating on the surface of the substrate.
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15. An object having at least one surface, the surface treated using an expanding inductively coupled plasma, said plasma generated by the method comprising the steps of:
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introducing energy and a reactant to a plasma generation apparatus of a plasma generator system for generating plasma; receiving a generated plasma in a plasma treatment chamber; and expanding and inductively coupling the generated plasma, wherein inductively coupling comprises positioning at least one electric coil in proximity to the generated plasma and energizing the at least one electric coil using a power source, wherein the expanding inductively coupled plasma is directed towards a surface of the object within the plasma treatment chamber for coating the surface with at least one coating and wherein the at least one electric coil is positioned within the plasma treatment chamber in a particular configuration for generating a particular deposition profile corresponding to the particular configuration for the at least one coating on the surface of the object.
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Specification