Methods for conformal coating and sealing microchip reservoir devices
First Claim
1. A method for sealing reservoirs containing molecules or devices in a microchip device, the method comprising:
- providing a substrate having a plurality of reservoirs, a front side, and a back side, the back side comprising a plurality of reservoir openings distal reservoir caps on the front side and in need of scaling;
loading reservoir contents comprising molecules, a secondary device, or both, into the reservoirs;
applying a buffering material over the reservoir contents in the reservoirs, the buffering material being discontinuous between the reservoirs; and
applying a conformal coating barrier layer onto the buffering material, wherein the conformal coating barrier layer is applied by vapor deposition, plating, spin coating, or multi-laminate coating.
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Abstract
Methods are provided for conformally coating microchip devices and for sealing reservoirs containing molecules or devices in a microchip device. One method comprises (i) providing a substrate having a plurality of reservoirs having reservoir openings in need of sealing; (ii) loading reservoir contents comprising molecules, a secondary device, or both, into the reservoirs; and (iii) applying a conformal coating barrier layer, such as a vapor depositable polymeric material, e.g., parylene, onto the reservoir contents over at least the reservoir openings to seal the reservoir openings. Another method comprises vapor depositing a conformal coating material onto a microchip device having at least two reservoirs and reservoir caps positioned over molecules or devices stored in the reservoirs, and providing that the conformal coating does not coat or is removed from the reservoir caps.
243 Citations
12 Claims
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1. A method for sealing reservoirs containing molecules or devices in a microchip device, the method comprising:
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providing a substrate having a plurality of reservoirs, a front side, and a back side, the back side comprising a plurality of reservoir openings distal reservoir caps on the front side and in need of scaling; loading reservoir contents comprising molecules, a secondary device, or both, into the reservoirs; applying a buffering material over the reservoir contents in the reservoirs, the buffering material being discontinuous between the reservoirs; and applying a conformal coating barrier layer onto the buffering material, wherein the conformal coating barrier layer is applied by vapor deposition, plating, spin coating, or multi-laminate coating. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
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Specification