Photomask and method for producing the same
First Claim
1. A photomask comprising on a transparent substrate:
- a semi-light-shielding portion having a light-shielding property with respect to exposure light;
a light-transmitting portion surrounded by the semi-light-shielding portion and having a light-transmitting property with respect to exposure light; and
a peripheral portion surrounded by the semi-light-shielding portion and positioned in a periphery of the light-transmitting portion,wherein the semi-light-shielding portion and the light-transmitting portion transmit the exposure light in a same phase,the peripheral portion transmits the exposure light in a phase opposite to that of the semi-light-shielding portion and the light-transmitting portion,a phase shift film that has a transmittance that allows the exposure light to be transmitted partially and transmits the exposure light in a phase opposite to that of the peripheral portion is formed on the transparent substrate in a formation region for the semi-light-shielding portion, anda surface of the transparent substrate in a formation region for the peripheral portion is exposed.
1 Assignment
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Accused Products
Abstract
A photomask includes a semi-light-shielding portion having a light-shielding property, a light-transmitting portion surrounded by the semi-light-shielding portion and a peripheral portion positioned in a periphery of the light-transmitting portion on a transparent substrate. The semi-light-shielding portion and the light-transmitting portion transmit the exposure light in the same phase each other, whereas the peripheral portion transmits the exposure light in a phase opposite to that of the light-transmitting portion. A phase shift film that transmits the exposure light in a phase opposite to that of the peripheral portion is formed on the transparent substrate in the semi-light-shielding portion formation region.
12 Citations
44 Claims
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1. A photomask comprising on a transparent substrate:
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a semi-light-shielding portion having a light-shielding property with respect to exposure light; a light-transmitting portion surrounded by the semi-light-shielding portion and having a light-transmitting property with respect to exposure light; and a peripheral portion surrounded by the semi-light-shielding portion and positioned in a periphery of the light-transmitting portion, wherein the semi-light-shielding portion and the light-transmitting portion transmit the exposure light in a same phase, the peripheral portion transmits the exposure light in a phase opposite to that of the semi-light-shielding portion and the light-transmitting portion, a phase shift film that has a transmittance that allows the exposure light to be transmitted partially and transmits the exposure light in a phase opposite to that of the peripheral portion is formed on the transparent substrate in a formation region for the semi-light-shielding portion, and a surface of the transparent substrate in a formation region for the peripheral portion is exposed. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21)
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22. A method for producing a photomask comprising:
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a semi-light-shielding portion having a light-shielding property with respect to exposure light; a light-transmitting portion surrounded by the semi-light-shielding portion and having a light-transmitting property with respect to exposure light; and a peripheral portion surrounded by the semi-light-shielding portion and positioned in a periphery of the light-transmitting portion on a transparent substrate, the method comprising; a first step of forming a phase shift film that has a transmittance that allows the exposure light to be transmitted partially and transmits the exposure light in a phase opposite to that of the peripheral portion on the transparent substrate in the semi-light-shielding portion formation region; and a second step of digging down the transparent substrate in the light-transmitting portion formation region so as to have a thickness that transmits the exposure light in a phase opposite to that of the peripheral portion after the first step, wherein the first step includes the step of removing the phase shift film in the peripheral portion formation region after the phase shift film is formed on an entire surface of the transparent substrate. - View Dependent Claims (23, 24, 25, 26)
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27. A method for producing a photomask comprising:
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a semi-light-shielding portion having a light-shielding property with respect to exposure light; a light-transmitting portion surrounded by the semi-light-shielding portion and having a light-transmitting property with respect to exposure light; and a peripheral portion surrounded by the semi-light-shielding portion and positioned in a periphery of the light-transmitting portion on a transparent substrate, the method comprising; a first step of forming a phase adjusting film that transmits the exposure light in a phase opposite to that of the peripheral portion and a transmittance adjusting film having a transmittance lower than that of the transparent substrate with respect to the exposure light sequentially on an entire surface of the transparent substrate, a second step of removing the phase adjusting film and the transmittance adjusting film in the peripheral portion formation region, and a third step of removing the transmittance adjusting film in the light-transmitting portion formation region after the second step, wherein the phase adjusting film and the transmittance adjusting film formed on the transparent substrate in the semi-light-shielding portion formation region constitute the phase shift film that has a transmittance that allows the exposure light to be transmitted partially and transmits the exposure light in a phase opposite to that of the peripheral portion. - View Dependent Claims (28)
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29. A photomask comprising on a transparent substrate:
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a semi-light-shielding portion having a light-shielding property with respect to exposure light; a light-transmitting portion surrounded by the semi-light-shielding portion and having a light-transmitting property with respect to exposure light; and a peripheral portion surrounded by the semi-light-shielding portion and positioned in a periphery of the light-transmitting portion, wherein the semi-light-shielding portion and the light-transmitting portion transmit the exposure light in a same phase, the peripheral portion transmits the exposure light in a phase opposite to that of the semi-light-shielding portion and the light-transmitting portion, a phase shift film that has a transmittance that allows the exposure light to be transmitted partially and transmits the exposure light in a phase opposite to that of the peripheral portion is formed on the transparent substrate in a formation region for the semi-light-shielding portion, and the peripheral portion is disposed apart from the light-transmitting portion by a predetermined distance. - View Dependent Claims (30, 31, 32, 33, 34, 35, 36)
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37. A photomask comprising on a transparent substrate:
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a semi-light-shielding portion having a light-shielding property with respect to exposure light; a light-transmitting portion surrounded by the semi-light-shielding portion and having a light-transmitting property with respect to exposure light; and a peripheral portion surrounded by the semi-light-shielding portion and positioned in a periphery of the light-transmitting portion, wherein the light-transmitting portion has a polygonal shape, the peripheral portion is composed of a plurality of rectangular regions, each region facing each side of the light-transmitting portion, the semi-light-shielding portion and the light-transmitting portion transmit the exposure light in a same phase, the peripheral portion transmits the exposure light in a phase opposite to that of the semi-light-shielding portion and the light-transmitting portion, and a phase shift film that has a transmittance that allows the exposure light to be transmitted partially and transmits the exposure light in a phase opposite to that of the peripheral portion is formed on the transparent substrate in a formation region for the semi-light-shielding portion, the phase shift film comprises; a transmittance adjusting film having a transmittance lower than that of the transparent substrate with respect to the exposure light, and a phase adjusting film that is formed on the transmittance adjusting film and transmits the exposure light in a phase opposite to that of the peripheral portion, and the transmittance adjusting film is also formed on the transparent substrate in a formation region for the peripheral portion. - View Dependent Claims (38, 39, 40)
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41. A method for producing a photomask comprising:
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a semi-light-shielding portion having a light-shielding property with respect to exposure light; a light-transmitting portion surrounded by the semi-light-shielding portion and having a light-transmitting property with respect to exposure light; and a peripheral portion surrounded by the semi-light-shielding portion and positioned in a periphery of the light-transmitting portion on a transparent substrate, the method comprising; a first step of forming a phase shift film that has a transmittance that allows the exposure light to be transmitted partially and transmits the exposure light in a phase opposite to that of the peripheral portion on the transparent substrate in the semi-light-shielding portion formation region, and a second step of digging down the transparent substrate in the light-transmitting portion formation region so as to have a thickness that transmits the exposure light in a phase opposite to that of the peripheral portion after the first step, wherein the peripheral portion and the light-transmitting portion are apart from each other. - View Dependent Claims (42, 43, 44)
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Specification