Plasma processing apparatus and method

• US 7,025,895 B2
• Filed: 08/15/2002
• Issued: 04/11/2006
• Est. Priority Date: 08/15/2002
• Status: Active Grant

• Current Assignee: Hitachi High-Tech Company Limited (Hitachi, Ltd.)
• Original Assignee: Hitachi High-Technologies Corporation (Hitachi, Ltd.)
• Inventors: Takahashi, Youji, Kashibe, Makoto
• Primary Examiner(s): MCDONALD, RODNEY GLENN
• Application Number:
  US10/218,422
• Publication Number:
  US 20040031566A1
• Time in Patent Office: 1,335 Days
• Field of Search: 422/186.04, 422/186.29, 216/67, 216/69, 216/59, 216/60, 216/61, 156/345.24, 156/345.28, 438/710, 204/298.03, 204/192.13, 204/298.32, 204/192.33, 118/723.E, 427/10
• US Class Current: 216/67
• CPC Class Codes: H01J 37/32935 Monitoring and controlling tubes by information coming from the object and/or discharge

Abstract

A plasma processing apparatus and method are capable of performing etching with high precision without damaging the semiconductor wafer. The plasma processing apparatus has a plasma generation power supply for generating a plasma within a processing chamber; a high-frequency power supply for applying a high frequency wave to a sample stage installed within the processing chamber; and control means for controlling the plasma generation power supply or the high-frequency power supply based on parameter settings for an output intensity and an output mode for each process step. In this regard, when the process steps are switched, the control means compares parameters for a current process step with those for a next process step and then switches either the output intensities or the output modes before switching the output modes or the output intensities, respectively.

Claims

1. A plasma processing apparatus comprising:

a processing chamber for processing a sample;

a plasma generation power supply for generating a plasma within said processing chamber;

a high-frequency power supply for applying a high frequency wave to a sample stage installed within said processing chamber; and

control means for controlling said plasma generation power supply or said high-frequency power supply based on parameter settings for an output intensity and an output mode for each process step;

wherein said plasma generation power supply or said high-frequency power supply has a continuous output mode and a modulation output mode;

wherein when said process steps are switched, said control means compares parameters for a current process step with those for a next process step and then switches either said output intensities or said output modes before switching said output modes or said output intensities, respectively;

wherein when said continuous output mode is switched to said modulation output mode, said control means switches said output modes before switching said output intensities; and

wherein an output intensity in said modulation output mode is higher than an output intensity in said continuous output mode.

2. The plasma processing apparatus as claimed in claim 1 wherein when said modulation output mode is switched to said continuous output mode, said control means switches said output intensities before switching said output modes.

3. The plasma processing apparatus as claimed in claim 2 wherein an output intensity in said continuous output mode is lower than an output intensity in said modulation output mode.

4. A plasma processing apparatus comprising:

a processing chamber for processing a sample;

a plasma generation power supply for generating a plasma within said processing chamber;

a high-frequency power supply for applying a high frequency wave to a sample stage installed within said processing chamber; and

control means for controlling said plasma generation power supply or said high-frequency power supply based on parameter settings for an output intensity and an output mode for each process step;

wherein said plasma generation power supply or said high-frequency power supply has a continuous output mode and a modulation output mode;

wherein when said process steps are switched, said control means compares parameters for a current process step with those for a next process step and then switches either said output intensities or said output modes before switching said output modes or said output intensities, respectively; and

wherein when said output intensity is increased at a time of switching said process steps, said control means switches said output modes before switching said output intensities.

5. The plasma processing apparatus as claimed in claim 4 wherein when said output intensity is decreased at a time of switching said process steps, said control means switches said output intensities before switching said output modes.

6. A plasma processing method wherein a plasma is generated within a processing chamber by use of a plasma generation power supply, a high frequency wave is applied to a sample stage installed within said processing chamber by use of a high-frequency power supply, and a sample mounted on said sample stage is processed, said method comprising the steps of:

controlling said plasma generation power supply or said high-frequency power supply based on parameter settings for an output intensity and an output mode for each process step;

wherein said plasma generation power supply or said high-frequency power supply has a continuous output mode and a modulation output mode;

when said process steps are switched, comparing parameters for a current process step with those for a next process step, and then switching either said output intensities or said output modes before switching said output modes or said output intensities, respectively, to process said sample;

when said continuous output mode is switched to said modulation output mode, switching said output modes before switching said output intensities to process said sample; and

wherein an output intensity in said modulation output mode is made higher than an output intensity in said continuous output mode to process said sample.

7. The plasma processing method as claimed in claim 6, wherein

said modulation output mode is switched to said continuous output mode, switching said output intensities before switching said output modes to process said sample.

8. The plasma processing method as claimed in claim 7 wherein an output intensity in said continuous output mode is made lower than an output intensity in said modulation output mode to process said sample.

9. A plasma processing method wherein a plasma is generated within a processing chamber by use of a plasma generation power supply, a high frequency wave is applied to a sample stage installed within said processing chamber by use of a high-frequency power supply, and a sample mounted on said sample stage is processed, said method comprising the steps of:

controlling said plasma generation power supply or said high-frequency power supply based on parameter settings for an output intensity and an output mode for each process step;

wherein said plasma generation power supply or said high-frequency power supply has a continuous output mode and a modulation output mode;

when said process steps are switched, comparing parameters for a current process step with those for a next process step, and then switching either said output intensities or said output modes before switching said output modes or said output intensities, respectively, to process said sample; and

when said output intensity is increased at a time of switching said process steps, switching said output modes before switching said output intensities to process said sample.

10. The plasma processing method as claimed in claim 9 wherein

when said output intensity is decreased at a time of switching said process steps, switching said output intensities before switching said output modes to process said sample.

11. A plasma processing method wherein a plasma is generated within a processing chamber by use of a plasma generation power supply, a high frequency wave is applied to a sample stage installed within said processing chamber by use of a high-frequency power supply, and a sample mounted on said sample stage is processed, said method comprising the steps of:

controlling said plasma generation power supply or said high-frequency power supply based on parameter settings for an output intensity and an output mode for each process step;

when a modulation output mode is to be switched to a continuous output mode between a current process step and a next process step, performing a process step of maintaining said modulation output mode but switching to said output intensity for said next process step to process said sample, said process step being provided between said current process step and said next process step; and

when said continuous output mode is to be switched to said modulation output mode between said current process step and said next process step, performing another process step of switching to said modulation output mode but maintaining said output intensity for said current process step to process said sample, said another process step being provided between said current process step and said next process step.

12. A plasma processing method wherein a plasma is generated within a processing chamber by use of a plasma generation power supply, a high frequency wave is applied to a sample stage installed within said processing chamber by use of a high-frequency power supply, and a sample mounted on said sample stage is processed, said method comprising the steps of:

controlling said plasma generation power supply or said high-frequency power supply based on parameter settings for an output intensity and an output mode for each process step;

when said output intensity is increased at a time of switching from a current process step to a next process step, performing a switchover process step of switching to said output mode for said next process step but maintaining said output intensity for said current process step to process said sample; and

when said output intensity is decreased at a time of switching from said current process step to said next process step, performing another switchover process step of maintaining said output mode for said current process step but switching to said output intensity for said next process step to process said sample.