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System for generating two-dimensional masks from a three-dimensional model using topological analysis

  • US 7,065,736 B1
  • Filed: 09/24/2003
  • Issued: 06/20/2006
  • Est. Priority Date: 09/24/2003
  • Status: Expired due to Fees
First Claim
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1. A method of generating two-dimensional masks from a three-dimensional model comprising:

  • providing a three-dimensional model representing a micro-electro-mechanical structure for manufacture and a description of process mask requirements;

    reducing the three-dimensional model to a topological description of unique cross sections;

    selecting candidate masks from the unique cross sections and a cross section topology; and

    reconciling the candidate masks based on the description of process mask requirements to produce two-dimensional process masks.

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