Vertical proximity processor

• US 7,069,937 B2
• Filed: 03/31/2003
• Issued: 07/04/2006
• Est. Priority Date: 09/30/2002
• Status: Expired due to Fees

• Current Assignee: Lam Research Corporation
• Original Assignee: Lam Research Corporation
• Inventors: Woods, Carl, Ravkin, Mike, Redeker, Fred C., Garcia, James P., de Larios, John
• Primary Examiner(s): KORNAKOV, MIKHAIL
• Application Number:
  US10/404,270
• Publication Number:
  US 20040060581A1
• Time in Patent Office: 1,191 Days
• Field of Search: 134/94.1, 134/99.1, 134/103.2, 134/103.3, 134/198, 134/199, 134/902, 134/137, 134/147, 134/148
• US Class Current: 134/199
• CPC Class Codes: B08B 3/04 Cleaning involving contact with liquid
• CPC Class Codes: C25D 17/001 Apparatus specially adapted for electrolytic coating of wafers, e.g. semiconductors or solar cells
• CPC Class Codes: C25D 5/34 Pretreatment of metallic surfaces to be electroplated
• CPC Class Codes: H01L 21/67028 for cleaning followed by drying, rinsing, stripping, blasting or the like
• CPC Class Codes: H01L 21/67034 for drying
• CPC Class Codes: H01L 21/67051 using mainly spraying means, e.g. nozzles
• CPC Class Codes: H01L 21/68707 the wafers being placed on a robot blade, or gripped by a gripper for conveyance
• CPC Class Codes: Y10S 134/902 Semiconductor wafer

Abstract

A method for processing a substrate is provided which includes generating a fluid meniscus on the surface of the vertically oriented substrate, and moving the fluid meniscus over the surface of the vertically oriented substrate to process the surface of the substrate.

Claims

1. A substrate preparation apparatus to be used in substrate processing operations, comprising:

an arm capable of vertical movement between a first edge of the substrate to a second edge of the substrate;

a holder for holding the substrate in a vertical orientation; and

a head coupled to the arm, the head being capable of forming a fluid meniscus on a surface of the substrate and capable of being moved over the surface of the substrate, and wherein the meniscus is defined on the substrate when in the vertical orientation; and

wherein the head includes,

at least one of a first source inlet for delivering a first fluid to the surface of the substrate through the head;

at least one of a second source inlet for delivering a second fluid to the surface of the substrate through the head, the second fluid being different than the first fluid; and

at least one of a source outlet for removing each of the first fluid and the second fluid from the surface of the substrate, the at least one of the source outlet being located to substantially surround the at least one of the first source inlet, and the at least one of the first source inlet, the at least one of the second source inlet, and the at least one of the source outlet being configured to act substantially simultaneously when in operation;

wherein the at least one of the second source inlet surrounds at least a trailing edge side of the at least one of the source outlet.

2. A substrate preparation apparatus as recited in claim 1, wherein the arm is configured to move the head down a diameter of the substrate.

3. A substrate preparation apparatus as recited in claim 1, wherein the fluid meniscus extends at least a radius of the substrate.

4. A substrate preparation apparatus as recited in claim 1, wherein the fluid meniscus has a length of at least a diameter of the substrate excluding an exclusion region of the substrate.

5. A substrate preparation apparatus as recited in claim 1, wherein the head extends at least a radius of the substrate.

6. A substrate preparation apparatus as recited in claim 1, wherein the arm is capable of moving the head into close proximity of the substrate.

7. A substrate preparation apparatus to be used in substrate processing operations, comprising:

an arm capable of vertical movement at least between a first edge of the substrate and a second edge of the substrate;

holder for holding the substrate in a vertical orientation; and

a head having a process surface side, the head being coupled to the arm, the head being capable of containing a fluid meniscus between a surface of the substrate and the process surface side of the head, the arm being configured to be moved over the surface of the substrate at least between the first edge and the second edge, such that the fluid meniscus to be formed on the surface of the substrate when in the vertical orientation, and wherein the head includes at least a first source inlet for delivering a fluid to the surface of the substrate and a source outlet for removing the fluid from the surface of the substrate, such that the fluid meniscus is contained between the surface of the substrate and the process side of the head.

8. A substrate preparation apparatus to be used in substrate processing operations, comprising:

n arm capable of vertical movement at least between a first edge of the substrate and a second edge of the substrate;

holder for holding the substrate in a vertical orientation; and

a head coupled to the arm, the head having a side that is configured to be proximate to a surface of the substrate and configured to be moved by the arm at least between the first edge and the second edge when proximate to the surface, the head having a source inlet for delivering a fluid to the surface of the substrate and a source outlet for removing the fluid from the surface of the substrate to define a meniscus on the surface of the substrate when the substrate is in the vertical orientation, the meniscus being defined between the side of the head that is configured to be proximate to the surface of the substrate and the surface of the substrate.