Method for depositing aluminum oxide coatings on flat glass
First Claim
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1. A chemical vapor deposition process for depositing an aluminum oxide coating on a hot glass substrate comprising:
- preparing a precursor gas mixture comprising an inorganic aluminum halide and an organic ester having a β
hydrogen on the alkyl group bonded to the carboxylate oxygen;
maintaining said precursor gas mixture at a temperature below the temperature at which the inorganic aluminum halide reacts with the ester to form an aluminum oxide coating while delivering the gaseous mixture to a coating chamber which opens onto the hot glass substrate; and
introducing the precursor gas mixture into the coating chamber, whereby the gaseous mixture is heated to above the reaction temperature of the aluminum halide and the ester and incorporates oxygen from the ester to cause the deposition of the aluminum oxide coating.
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Abstract
A chemical vapor deposition process for laying down an aluminum oxide coating on a glass substrate through the use of an organic ester having a β hydrogen on the alkyl group bonded to the carboxylate oxygen and an inorganic aluminum halide. The resulting article has an aluminum oxide coating which can be of substantial thickness because of the high deposition rates attainable with the novel process. Preferably, the coating deposition rates resulting from the method of the present invention may be greater than or equal to 200 Å per second.
36 Citations
24 Claims
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1. A chemical vapor deposition process for depositing an aluminum oxide coating on a hot glass substrate comprising:
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preparing a precursor gas mixture comprising an inorganic aluminum halide and an organic ester having a β
hydrogen on the alkyl group bonded to the carboxylate oxygen;maintaining said precursor gas mixture at a temperature below the temperature at which the inorganic aluminum halide reacts with the ester to form an aluminum oxide coating while delivering the gaseous mixture to a coating chamber which opens onto the hot glass substrate; and introducing the precursor gas mixture into the coating chamber, whereby the gaseous mixture is heated to above the reaction temperature of the aluminum halide and the ester and incorporates oxygen from the ester to cause the deposition of the aluminum oxide coating. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
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15. An atmospheric pressure chemical vapor deposition process for depositing an aluminum oxide coating on a hot glass substrate comprising:
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preparing a precursor gas mixture comprising an inorganic aluminum halide and an organic ester having a β
hydrogen on the alkyl group bonded to the carboxylate oxygen;maintaining said precursor gas mixture at a temperature below the temperature at which the inorganic aluminum halide reacts to form an aluminum oxide coating while delivering the gaseous mixture to a coating chamber which opens onto the hot glass substrate; and introducing the precursor gas mixture into the coating chamber, the coating chamber being at, essentially, atmospheric pressure, whereby the gaseous mixture is heated to a temperature above the reaction temperature of the aluminum halide and the ester, and incorporates oxygen from the ester to cause the deposition of the aluminum oxide coating. - View Dependent Claims (16, 17, 18, 19, 20, 21, 22, 23)
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24. A method of utilizing an inorganic aluminum halide and an organic ester having a β
- hydrogen on the alkyl group bonded to the carboxylate oxygen to form an aluminum oxide coating on a hot glass substrate by chemical vapor deposition.
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